Solid CVD SiC Rings

​Semicorex solid CVD SiC rings are commonly mounted inside etching equipment reaction chambers, surrounding the electrostatic chucks to serve as a process barrier and energy guide. They can concentrate the plasma within the chamber around the wafer and prevent outward plasma diffusion, thus providing a suitable energy field for the precise etching process. This uniform and stable energy field can effectively mitigate risks such as wafer defects, process drift, and semiconductor device yield loss caused by uneven energy distribution and plasma distortion at the edge of the wafer.

Excellent material advantages

Semicorex solid CVD SiC rings are manufactured from high-purity CVD SiC, offering excellent material advantages to fully meet the stringent requirements for high cleanliness and high corrosion resistance in semiconductor etching environments.

1. High purity

The purity of Semicorex solid CVD SiC rings can exceed 99.9999%, which means that the rings are nearly free of internal impurities. This exceptional material purity greatly avoids the unwanted contamination of semiconductor wafers and the process chambers from impurity release during semiconductor etching processes.

2. High corrosion resistance

Semicorex solid CVD SiC rings can maintain structural integrity and performance stability even when they are exposure to strong acids, alkalis and plasma due to the superior corrosion resistance of CVD SiC, making them the ideal solutions for harsh etching processing environments.

3. Reliable thermal management performance

CVD SiC features high thermal conductivity and minimal thermal expansion coefficient, making Semicorex solid CVD SiC rings achieve fast heat dissipation and retain excellent dimensional stability during operation.

4. Exceptional resistance uniformity

Semicorex solid CVD SiC rings deliver exceptional resistance uniformity with RRG < 5%.

Resistivity ranges: Low Res. (<0.02 Ω·cm), Middle Res. (0.2–25 Ω·cm), High Res. (>100 Ω·cm).

Precise quality control

Semicorex solid CVD SiC rings are processed and inspected under rigorous standards to fully meet the strict precision and quality requirements of Semiconductor and microelectronics fields.

Surface treatment: Polishing precision is Ra < 0.1µm; fine grinding precision is Ra > 0.1µm

Processing precision is controlled within ≤ 0.03 mm

Quality inspection: Semicorex solid CVD SiC rings will undergo dimensional measurement, resistivity testing, and visual inspection to ensure the product is free from chips, scratches, cracks, stains and other defects.