Products

Semicorex SiC Oxidation Tube is a high-performance component used in SiC tube furnaces for advanced semiconductor thermal processing. It is designed for long-term stability in extreme conditions. Choose Semicorex for our superior material purity, tight dimensional control, and consistent product quality, helping you achieve optimal results in every high-temperature run.*

Semicorex Porous SiC Chuck is a high-performance ceramic vacuum chuck designed for secure and uniform wafer adsorption in semiconductor processing. Its engineered micro-porous structure ensures excellent vacuum distribution, making it ideal for precision applications.*

Semicorex SiC Vacuum Chucks are high-performance ceramic fixture designed for secure wafer adsorption in semiconductor manufacturing. With superior thermal, mechanical, and chemical properties, it ensures stability and precision in demanding process environments.*

Semicorex SiC Carrier for ICP is a high-performance wafer holder made of SiC-coated graphite, designed specifically for use in inductively coupled plasma (ICP) etching and deposition systems. Choose Semicorex for our world-leading anisotropic graphite quality, precision small-batch manufacturing, and uncompromising commitment to purity, consistency, and process performance.*

Semicorex SiC Coated Plate is a precision-engineered component made from graphite with a high-purity silicon carbide coating, designed for demanding epitaxial applications. Choose Semicorex for its industry-leading CVD coating technology, strict quality control, and proven reliability in semiconductor manufacturing environments.*

Semicorex SiC Cantilever Paddles are high-performance silicon carbide cantilever paddles used in semiconductor thermal processing equipment, designed for stable wafer handling in high-temperature environments. Choosing Semicorex means choosing high-purity materials, excellent thermal stability and industry-leading precision manufacturing technology to ensure that every critical process of yours is stable and reliable.*