Manufactured from high-quality porous silicon carbide ceramics, Semicorex porous SiC vacuum chucks are the high-precision wafer clamping tools specifically designed for the clean, damage-free handling of thin and fragile wafers. By choosing Semicorex, you will enjoy the optimal wafer clamping and positioning solutions for cutting-edge semiconductor manufacturing processes.
Semicorex porous SiC vacuum chucks are the indispensable components, which are able to extensively used in the advanced semiconductor manufacturing processes, such as wafer thinning, dicing, grinding, polishing, photolithography, etching. Their adsorption platform is constructed with a porous SiC ceramic plate with numerous evenly distributed micron-scale pores. With consistent pore diameter and exceptional through-hole rate, Semicorex porous SiC vacuum chucks provide a smooth gas path for vacuum evacuation. During operation, the stable and uniform negative pressure is generated between the chuck and the wafer, allowing high-efficient vacuum clamping and release of semiconductor wafers.
Semiconductor wafers processed in advanced semiconductor manufacturing are extremely thin, so even slight bending, vibration, or uneven local stress may lead to wafer breakage, warping, and reduced accuracy in critical processes like lithography. Semicorex porous SiC vacuum chucks are processed via high-precision grinding and polishing, achieving a perfect surface roughness of Ra < 0.1 μm. This enables Semicorex porous SiC vacuum chucks to provide an optimized operational surface for high-precision semiconductor manufacturing.
To fully meet the strict semiconductor cleanliness standards, Semicorex manufactures porous SiC vacuum chucks with high-purity silicon carbide raw materials via high-temperature sintering. This ensures the chucks are free from particle shedding and migratable metallic contamination. Benefiting from the excellent chemical stability of SiC, Semicorex porous SiC vacuum chucks are able to withstand the harsh corrosion environments and generate no extra by-products, making them highly suited for the high-grade clean semiconductor fabrication processes.
Vacuum chucks used in production lines must withstand thousands of adsorption and release cycles, as well as long-term temperature fluctuations. This imposes extremely high requirements on material performance of vacuum chucks. Semicorex porous SiC vacuum chucks feature outstanding material hardness and wear resistance, with stable thermal expansion. They show no creep or performance degradation at high-temperature conditions, which significantly extends their service life and reduces component maintenance and replacement frequency.