Silicon epitaxy is a primary fabrication process for integrated circuits. It allows IC devices to be fabricated on lightly doped epitaxial layers with heavily doped buried layers, while also forming grown PN junctions, thus solving the isolation problem of ICs. Silicon epitaxial wafers are also a pr......
Read MoreDry etching is a main technology in the manufacturing processes of micro-electro-mechanical systems. The performance of dry etching process exerts a direct influence on the structural precision and operational performance of semiconductor devices. To precisely control the etching process, the close ......
Read MoreSilicon carbide aerostatic slideway is an advanced guideway system that combines the material properties of silicon carbide and aerostatic technology. Servicing as the optimal solution for high-precision, high-reliability and long-term motion systems, silicon carbide aerostatic slideway is widely us......
Read MoreThe mainstream method for preparing silicon carbide single crystals is the physical vapor transport (PVT) method. This method mainly consists of a quartz tube cavity, a heating element (induction coil or graphite heater), graphite carbon felt insulation material, a graphite crucible, a silicon carbi......
Read MoreSOI, short for Silicon-On-Insulator, is a semiconductor manufacturing process based on special substrate materials. Since its industrialization in the 1980s, this technology has become an important branch of advanced semiconductor manufacturing processes. Distinguished by its unique three-layer com......
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