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Gas Inlet Ring for Semiconductor Equipment

Gas Inlet Ring for Semiconductor Equipment

Semicorex is a large-scale manufacturer and supplier of Silicon Carbide Coated Graphite Susceptor in China. We focus on semiconductor industries such as silicon carbide layers and epitaxy semiconductor. Our Gas Inlet Ring for Semiconductor Equipment has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Semicorex Gas Inlet Ring for Semiconductor Equipment is SiC Coated, which is a dense, wear-resistant silicon carbide (SiC) coating. It has high corrosion and heat resistance properties as well as excellent thermal conductivity. We apply SiC in thin layers onto the graphite using the chemical vapor deposition (CVD) process.

Our Gas Inlet Ring for Semiconductor Equipment is designed to achieve the best laminar gas flow pattern, ensuring evenness of thermal profile. This helps to prevent any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.

Contact us today to learn more about our Gas Inlet Ring for Semiconductor Equipment.


Parameters of Gas Inlet Ring for Semiconductor Equipment

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Gas Inlet Ring for Semiconductor Equipment

● High purity SiC coated graphite

● Superior heat resistance & thermal uniformity

● Fine SiC crystal coated for a smooth surface

● High durability against chemical cleaning

● Material is designed so that cracks and delamination do not occur.




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