Furnace Tubes for LPCVD

The LPCVD process is a thin-film deposition process carried out under low-pressure (typically ranging from 0.1 to 1 Torr) vacuum conditions. These low-pressure vacuum operating conditions can help promote the uniform diffusion of precursor gases across the wafer surface, making it ideal for the precise deposition of materials including Si₃N₄, poly-Si, SiO₂, PSG, and certain metal films such as tungsten.

Furnace tubes are the essential components for LPCVD, which serve as the stable creation chambers for wafer LPCVD processing and contribute to outstanding film uniformity, exceptional step coverage, and high film quality of semiconductor wafers.

The advantages of Semicorex furnace tubes for LPCVD

1.Reliable Sealing performance

Semicorex furnace tubes for LPCVD are manufactured using 3D printing technology, featuring a seamless, integral structure. This weakness-free integral structure avoids the seams and leakage risks associated with traditional welding or assembly processes, ensuring better process sealing.  Semicorex furnace tubes for LPCVD are particularly suitable for low-pressure, high-temperature LPCVD processes, which can significantly avoids process gas leakage and outside air intrusion.

2.Excellent thermal Properties

Manufactured from high-quality semiconductor-grade raw materials, Semicorex furnace tubes for the LPCVD feature high thermal conductivity and excellent thermal shock resistance. These outstanding thermal properties make Semicorex furnace tubes for the LPCVD to operate stably at temperatures ranging from 600 to 1100°C and provide uniform temperature distribution for high-quality wafer thermal processing.

3.Strict cleanliness control

Semicorex controls the cleanliness of furnace tubes starting at the material selection stage. The use of high-purity raw materials grants Semicorex furnace tubes for LPCVD an unmatched low impurity content. The impurity level of the matrix material is controlled below 100 PPM and the CVD SiC-coating material is kept below 1 PPM. Additionally, each furnace tube undergoes rigorous cleanliness inspection before delivery to prevent impurity contamination during the LPCVD process.

4.Uniform and dense coating protection

Through chemical vapor deposition, Semicorex furnace tubes for LPCVD are firmly covered with a dense and uniform SiC coating. These CVD SiC coatings exhibit strong adhesion, which effectively prevents the risks of coating peeling and component degradation even when exposed to the harsh high-temperature and corrosive conditions.