CVD Coating Wafer Holder

Semicorex CVD Coating Wafer Holder is a high-performance part, designed to support and hold wafers during the precise growth of semiconductor materials using epitaxy processes. It is coated with tantalum carbide (TaC), which contributes to its outstanding durability and reliability in demanding conditions.

Key Features:

Tantalum Carbide Coating: Wafer holder coating with tantalum carbide (TaC) is due to its hardness, wear resistance, and thermal stability. This coating contributes significantly to the ability of the product to resist harsh chemical environments as well as high temperatures and finds application in bearing exactly what is required from semiconductor manufacturing.

Supercritical Coating Technology: Coating is applied using a supercritical fluid deposition method which guarantees the uniform and dense layer of TaC. Advanced coating technology provides better adhesion and defect reduction, delivering a high-quality, long-lasting coating with assured longevity.

Coating Thickness: The TaC coating can reach a thickness of up to 120 microns, providing an ideal balance of durability and precision. This thickness ensures that the wafer holder can withstand high temperatures, pressures, and reactive environments without compromising its structural integrity.

Excellent Thermal Stability: The tantalum carbide coating offers outstanding thermal stability, allowing the wafer holder to perform reliably in the high-temperature conditions typical of semiconductor epitaxy processes. This feature is crucial for maintaining consistent results and ensuring the quality of the semiconductor material.

Corrosion and Wear Resistance: The TaC coating provides excellent resistance to corrosion and wear, ensuring the wafer holder can endure exposure to reactive gases and chemicals commonly found in semiconductor processes. This durability extends the life of the product and reduces the need for frequent replacements, enhancing operational efficiency.

Applications:

The CVD Coating Wafer Holder is specifically designed for semiconductor epitaxy processes, where precise control and material integrity are essential. It is used in techniques such as molecular beam epitaxy (MBE), chemical vapor deposition (CVD), and metal-organic chemical vapor deposition (MOCVD), where the wafer holder must withstand extreme temperatures and reactive environments.

In semiconductor epitaxy, precision is crucial for growing high-quality thin films on a substrate. The CVD Coating Wafer Holder ensures wafers are securely supported and maintained under optimal conditions, contributing to the consistent production of high-quality semiconductor materials.

Semicorex CVD Coating Wafer Holder is engineered using cutting-edge materials and advanced coating technologies to meet the high demands of semiconductor epitaxy. The use of supercritical fluid deposition for a thick, uniform TaC coating ensures unmatched durability, precision, and longevity. With its superior thermal and chemical resistance, our wafer holder is designed to deliver reliable performance in the most challenging environments, helping to improve the efficiency of your semiconductor manufacturing processes.