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TaC-Coated Graphite Wafer Susceptors

TaC-Coated Graphite Wafer Susceptors

Semicorex TaC-coated graphite wafer susceptors are the cutting-edge components ypically applied to stably support and position the semiconductor wafers during the advanced semiconductor epitaxial processes. Leveraging state-of-the-art production technologies and mature manufacturing experience, Semicorex is committed to supplying the custom-engineered TaC-coated graphite wafer susceptors with market-leading quality for our valued customers.

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Product Description

With the continuous advancement of modern semiconductor manufacturing processes, the requirements for epitaxial wafers in terms of film uniformity, crystallographic quality and process stability have become increasingly stringent. For this reason, the use of high-performance and durable TaC-coated graphite wafer susceptors in the production process is significant to ensure stable deposition and high-quality epitaxial growth.




The advantages of Semicorex TaC-coated graphite wafer susceptors


1. The Excellent Material Selections

(1) Matrix material

Semicorex used premium high-purity graphite as the matrix of wafer susceptors, which delivers superior thermal conductivity, high-temperature resistance, as well as mechanical strength and hardness. Its coefficient of thermal expansion is highly matched with that of the TaC coating, effectively ensuring firm adhesion and preventing the coating from peeling or spalling.

(2) Coating material

Tantalum carbide is high-performing material with an extremely high melting point (approximately 3880℃), excellent thermal conductivity, superior chemical stability, and outstanding mechanical strength. The specific performance parameters are as follows:


2. Exceptional coating performance

Semicorex employs state-of-the-art CVD technology to uniformly and firmly adhere the TaC coating to the graphite matrix, effectively reducing the risk of coating cracking or peeling caused by high temperatures and chemical corrosion operating conditions. Additionally, Semicorex's precision processing technology achieves nanometer-level surface flatness for TaC-coated graphite wafer susceptors, and their coating tolerances are controlled at the micrometer level, providing optimal platforms for wafer epitaxial deposition.


3. Semiconductor-grade cleaning level

Graphite matrices cannot be directly used in processes such as Molecular Beam Epitaxy (MBE), Chemical Vapor Deposition (CVD), and Metal-Organic Chemical Vapor Deposition (MOCVD). The application of TaC coatings effectively avoids contamination of the wafer caused by the reaction between the graphite matrix and chemicals, thus preventing impact on the final deposition performance. To ensure semiconductor-level cleanliness within the reaction chamber, each Semicorex TaC-coated graphite wafer susceptor that need to be in direct contact with semiconductor wafers undergoes ultrasonic cleaning before vacuum packaging.

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