Single-Crystal Silicon Electrodes

Single-crystal silicon electrodes are typically installed at the top of the etching chamber, serving as the upper electrode. The surface of single-crystal silicon electrodes features uniformly distributed microholes, which can evenly deliver etching gas into the reaction chamber. During the etching process, they work with the lower electrode to generate a uniform electric field, which contributes to providing an ideal operating condition for precision etching.

Careful material selections

Semicorex selects premium MCZ-grown monocrystalline silicon to manufacture single-crystal silicon electrodes, offering industry-leading product performance and quality.

1. Ultra-high purity

Semicorex single-crystal silicon electrodes feature an ultra-high purity of over 99.9999999%, which means that the content of internal metal impurities is extremely low.

2. Exceptional resistance uniformity

Different from the conventional CZ single-crystal silicon, the MCZ-grown monocrystalline silicon used by Semicorex achieves resistivity uniformity below 5%. Its low res. is controlled below 0.02 Ω·cm, middle res. is between 0.2 and 25Ω·cm, and high res. is between 70-90 Ω·cm (customization is available upon request).

3. Excellent material structure

The single-crystal silicon grown via the MCZ method offers a more stable structure and fewer defects, making Semicorex single-crystal silicon electrodes deliver remarkable plasma corrosion resistance and withstand harsh etching operating conditions.

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High-standard processing precision

Semicorex single-crystal silicon electrodes are manufactured through a complete production process from silicon ingot to finished product, including slicing, surface grinding, hole drilling, wet etching, and surface polishing. Semicorex upholds stringent precision control in each step to ensure the diameter, thickness, surface planarity, hole spacing, and aperture of the electrodes are maintained within ideal tolerances.

1. Microhole processing

The micro-holes on single-crystal silicon electrodes feature uniform spacing and consistent diameters (ranging from 0.2 to 0.8 mm), with smooth and burr-free inner walls. This effectively guarantees uniform and stable supply of etching gas, thus ensuring the uniformity and precision of wafer etching.

2. Processing accuracy

The processing accuracy of Semicorex single-crystal silicon electrodes is controlled within 0.3 mm, and their polishing precision can be strictly controlled below 0.1 µm, and fine grinding is less than 1.6 µm.