Silicon Injector

Semicorex Silicon Injector is an ultra-high purity component designed for the precise delivery of gas in low pressure chemical vapor deposition (LPCVD) systems for polysilicon and thin film deposition. Constructed from 9N (99.9999999%) high purity silicon, this fine tubular injector provides superior cleanliness, compatibility with chemicals, and thermal stability in extreme process conditions.

As semiconductor manufacturing continues to evolve to higher levels of integration and tighter control of contamination, every gas delivery component in the deposition chamber will also be required to meet higher standards than before. The Semicorex Silicon Injector has been developed specifically for these types of requirements—delivering gaseous materials in a stable and uniform way throughout the reaction chamber without introducing contamination that would negatively effect film quality, or wafer yield.

The injector is manufactured from monocrystalline or polycrystalline silicon depending on process requirements, and the material is designed to be low metallic, particulate, and ionic impurities. This provides for compatibility with ultra-clean LPCVD conditions, where even trace contamination can induce a defect in the film or failure of a device. The use of silicon as the base material also reduces material mismatching between the injector and silicon components of the chamber, which significantly lowers particle generation risks or chemical reactions during usage and high-temperature operation.

The dedicated tubular structure of the Silicon Injector allows for a controlled and equal distribution of gas over a uniform wafer load. The micro-engineered orifices and smooth inner surface ensure reproducible flow rates along with laminar gas dynamics that are critical for consistent film thickness and stable deposition rates in the furnace. Whether it is silane (SiH₄), dichlorosilane (SiH₂Cl₂), or other reactive gases, the injector offers dependable performance and precision required for good quality polysilicon film growth.

Due to excellent thermal stability, the Semicorex Silicon Injector can withstand temperatures up to 1250 °C and may be controlled without fear of deformation, cracking, or warping during multiple cycles of high-temperature LPCVD. Additionally, its high resistence to oxidation and chemical inertness provide long runs while in oxidizing, reducing, or corrosive atmosphere while reducing maintenance and creating process stability.

Each injector is manufactured using state-of-the-art CNC machining and polishing, achieving sub-micron dimensional tolerances and ultra-smooth finishes to the surface. The high quality surface finish minimizes gas turbulence, creating very few to no particles while ensuring consistent flow characteristics across inconsistent thermal and pressure changes. Precision manufacturing ensures tightly controlled processes, reproducible an reliable results, and therefore consistent equipment performance.

Semicorex manufactures bespoke Silicon Injectors, available in custom lengths, diameters, and nozzle configurations. Tailored solutions can be developed to enhance gas dispersion patterns for one-off reactor geometries or deposition recipes. Each Injector is inspected and verified for purity to deliver the highest level of semiconductor-grade silicon components.

Semicorex Silicon Injector provides the precision and purity required in today's semiconductor manufacturing. Incorporating 9N ultra-high purity silicon, micron-level machining accuracy, and high thermal and chemical stability provides uniform gas distribution, lower particle generation, and exceptional reliability when depositing LPCVD polysilicon.