Single Crystal Silicon Showerhead

Semicorex single crystal silicon showerhead shows exceptional corrosion resistance, low expansion coefficient, and excellent heat conductivity. Sturdily adapting to the harsh conditions of high temperature, high corrosiveness, and high vacuum in semiconductor manufacturing, it exhibits exceptional tolerance to process gases like etching and deposition gases. Therefore, The single crystal silicon showerhead is widely used in semiconductor cleaning processes, oxidation processes, deposition processes and etching processes.

Semicorex employs advanced surface treatment techniques to ensure that the surface of the single crystal silicon showerhead features both extremely high flatness and smoothness. Meanwhile, relying on the standardized design of channel structure and gas path, the surface of the single crystal silicon showerhead is uniformly distributed with many pores of the same diameter(the minimum diameter can reach 0.2 millimeters). The pore diameter tolerance of the single crystal silicon showerhead is precisely controlled at the micrometer level, and the inner wall of the pore must be smooth and free of burrs, ensuring the distribution accuracy and uniformity of the process gas from the structural and process aspects.

Semicorex provides expert customization services to meet the various client needs. According to the various needs of its clients, it can customize appearance solutions to fit the dimensions and form of their reaction chambers. The optimized design enables the wafers to make full and consistent contact with the process gas throughout the reaction process by guaranteeing that the gas is dispersed evenly throughout the reaction chamber. This ultimately enhances production efficiency and product quality.