SiC Ceramic Paddle

Semicorex SiC ceramic paddle is an advanced part that was developed for high-temperature semiconductor furnace applications like oxidation and diffusion. The paddle acts as cantilever support to hold and move the wafers at high temperatures. The Semicorex SiC ceramic paddle gives high-purity, high-strength ceramic components to high-temperature processes that demand reliability, stability, and performance demanding through the production process.

The paddles are produced from high-purity silicon carbide (SiC), specifically formulated to withstand the tough thermal and chemical environments of a semiconductor manufacturing process. When wafers are treated through oxidation and diffusion, the wafer is exposed to temperatures greater than 1000 degrees C, as well as reactive gases such as oxygen, steam or dopant atmospheres. At these temperatures, structural integrity will depend on purity of the material.

Another important characteristic of SiC ceramic paddles is their superb performance at high temperatures. Because of SiC's melting point of 2700+C, the paddles retain strength and mechanical stability when exposed to high tem

peratures over time. The thermal property limits warping and cracking of the material during repeated heating and cooling cycles while providing a long service life in production environments.

Processing of semiconductors demands an ultra-clean environment since even trace amounts of impurities can impact yield and behavior of devices. The SiC material used in the paddles has a chemically vapor deposited (CVD) SiC coating that promotes exceptionally high material purity while minimizing metallic contamination. The SiC ceramic paddle remain clean and stable for their entire lifespan. As cantilever supports, the paddles need to provide a secure support for wafer carriers or boats during insertion and removal from the furnace. Because of SiC's inherent strength and rigidity, they possess good load-bearing properties with minimal deflection, which is essential for proper wafer handling and alignment. In oxidation and diffusion furnaces, corrosive atmospheres can attack and degrade traditional materials over time, but the SiC has the capability of maintaining its chemical stability, extending the usable life of the paddle. This results in dramatically reduced maintenance and replacement costs, since the paddles do not need to be replaced or repaired nearly as often.

In addition to performance, there is flexibility in customizing paddles for specific equipment and processes. Dimensions, tolerances, and surface finish can be made flexible to ensure fit between furnace designs and any other wafer handling system. The ability to achieve high degrees of dimensional accuracy with precision machining of the ceramic will also allow paddles to be produced to meet complex geometries. This entire range of features is intended to provide seamless operation and easy integration into existing production lines.

SiC ceramic paddles, with their combination of high purity, thermal stability, mechanical strength, and chemical resistance, are essential materials in semiconductor oxidation and diffusion processes. By providing a stable, clean platform for wafer transfer, they directly contribute to improved yield, process consistency, and overall manufacturing efficiency.