SiC Cantilever Paddle

Semicorex SiC (Silicon Carbide) Cantilever Paddle is a crucial component used in semiconductor manufacturing processes, particularly in diffusion or LPCVD (Low-Pressure Chemical Vapor Deposition) furnaces during processes like diffusion and RTP (Rapid Thermal Processing). It serves the purpose of supporting and transporting wafers within the process tube of these furnaces.

Semicorex SiC Cantilever Paddle is primarily composed of Silicon Carbide, a robust and thermally stable material known for its high-temperature resistance and excellent mechanical properties. SiC is chosen for its ability to withstand the harsh conditions encountered within the high-temperature process environments of semiconductor furnaces. The design of the SiC Cantilever Paddle allows it to extend into the process tube of the furnace while being firmly anchored at one end outside the tube. This design ensures stability and support for the wafers being processed while minimizing interference with the thermal environment inside the furnace.

The SiC Cantilever Paddle is to carry semiconductor wafers securely within the process tube during various high-temperature processes such as diffusion and RTP. Its robust construction ensures that it can withstand the extreme temperatures and chemical environments encountered during these processes without degradation or failure. SiC Cantilever Paddles are designed to be compatible with a wide range of semiconductor wafer sizes and shapes commonly used in the industry. They are often customizable to accommodate specific furnace configurations and process requirements.