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China Wafer Transfer System Manufacturers, Suppliers, Factory

We are commitment to offer the competitive price ,outstanding products quality, as well as fast delivery for Wafer Transfer System,Wafer Carrier Box,Wafer Boat Holder,Wafer Shipping Box,Ceramic Wafer Carrier Box, On account of superior top quality and aggressive selling price , we'll be the market leader, be sure to don’t wait to get in touch with us by phone or email, should you be intrigued in almost any of our products.
Wafer Transfer System, we have now complete material production line, assembling line , quality control system, and the most importantly, we now have many patents technology and experienced technical&production team, expert sales service team. With all those advantages, we're about to create"the reputable international brand of nylon monofilaments", and spreading our solutions to every corner of the world. We've been keep moving and try our best to serve our customers.

Hot Products

SiC Plate for ICP Etching Process
Semicorex's SiC Plate for ICP Etching Process is the perfect solution for high-temperature and harsh chemical processing requirements in thin film deposition and wafer handling. Our product boasts superior heat resistance and even thermal uniformity, ensuring consistent epi layer thickness and resistance. With a clean and smooth surface, our high-purity SiC crystal coating provides optimal handling for pristine wafers.
Inductively-Coupled Plasma (ICP)
Semicorex's silicon carbide coated susceptor for Inductively-Coupled Plasma (ICP) is designed specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers ensure even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.
ICP Plasma Etching Tray
Semicorex's ICP Plasma Etching Tray is engineered specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers provide even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.
TaC Coating Epitaxial Plate
You can rest assured to buy TaC Coating Epitaxial Plate from our factory. Semicorex TaC (Tantalum Carbide) coating epitaxial plate boasts exceptional heat resistance, making it ideal for applications subjected to high temperatures. Its remarkable ability to withstand heat ensures durability and reliability in demanding environments. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
Tantalum Carbide Coating Halfmoon Part
Semicorex Tantalum Carbide Coating Halfmoon Part is a highly specialized component designed for use in the epitaxial deposition process. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
TaC-Coating Crucible
Semicorex TaC-Coating Crucible has emerged as an essential tool in the pursuit of high-quality semiconductor crystals, enabling advancements in material science and device performance. The TaC-Coating Crucible's unique combination of properties makes them ideally suited for the demanding environments of crystal growth processes, offering distinct advantages over traditional materials.**

Related Blog
Reviews

How to do CMP Process
In the process of silicon wafer manufacturing, after the crystal rod is cut into silicon wafers, it will need to be polished and cleaned to obtain a single crystal silicon wafer like a mirror.
Thin film growth process
Common thin films are mainly divided into three categories: semiconductor thin films, dielectric thin films, and metal/metal compound thin films.
Understanding the Etching Differences Between Silicon and Silicon Carbide Wafers
Etching Process: Silicon vs. Silicon Carbide
Oxidation in Semiconductor Processing
Oxidation processes play a critical role in preventing such problems by creating a protective layer on the wafer, known as the oxide layer, which acts as a barrier between different chemicals.
Monocrystalline Silicon Manufacturing
The three primary methods used in monocrystalline silicon manufacturing are the Czochralski (CZ) method, the Kyropoulos method, and the Float Zone (FZ) method.
How to Choose the Right Rigid Felt for Soundproofing and Acoustic Panels
The core of a great acoustic treatment often lies in a specialized material: Rigid Felt. Not all felts are created equal, and selecting the right one is crucial for performance and durability.

China Wafer Transfer System Manufacturers, Suppliers, Factory

Related Products

Hot Products

SiC Plate for ICP Etching Process

Inductively-Coupled Plasma (ICP)

ICP Plasma Etching Tray

TaC Coating Epitaxial Plate

Tantalum Carbide Coating Halfmoon Part

TaC-Coating Crucible

How to do CMP Process

Thin film growth process

Understanding the Etching Differences Between Silicon and Silicon Carbide Wafers

Oxidation in Semiconductor Processing

Monocrystalline Silicon Manufacturing

How to Choose the Right Rigid Felt for Soundproofing and Acoustic Panels

Fanny 2023-10-24 12:09:34

Lindsay 2023-05-20 02:03:17

olivier musset 2023-04-03 08:17:30

Lesley 2023-03-09 13:47:37

Victoria 2023-07-11 23:37:48

Hedda 2024-02-14 02:07:00

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