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  • Semiconductor Wafer Boat for Vertical Furnaces

    Semiconductor Wafer Boat for Vertical Furnaces

    Semicorex semiconductor wafer boat for vertical furnaces is a specialized tool used in the manufacturing process of semiconductor devices. It is designed to hold and transport silicon wafers during the various stages of wafer processing in a vertical furnace. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • CVD Silicon Carbide Showerhead

    CVD Silicon Carbide Showerhead

    Semicorex CVD Silicon Carbide Showerhead is an essential and highly specialized component in the semiconductor etching process, particularly in the manufacturing of integrated circuits. With our unwavering commitment to delivering top-quality products at competitive prices, we are poised to become your long-term partner in China.*
  • CFC Nut and Bolt

    CFC Nut and Bolt

    Semicorex is proud to present the CFC Nut and Bolt, a groundbreaking innovation in the realm of high-performance fasteners. Developed from a sophisticated carbon fiber matrix, this product embodies the pinnacle of composite material engineering, designed specifically to meet the demands of high-temperature environments where traditional materials fall short.
  • Silicon Nitride Roller

    Silicon Nitride Roller

    The Silicon Nitride Roller, presented by Semicorex, is crafted from gas pressure sintered silicon nitride (Si3N4), a high-performance ceramic material.
  • SiC Focus Ring

    SiC Focus Ring

    Semicorex SiC Focus Ring is a high-purity silicon carbide ring component designed to optimize plasma distribution and wafer process uniformity in semiconductor manufacturing. Choosing Semicorex means ensuring consistent quality, advanced material engineering, and reliable performance trusted by leading semiconductor fabs worldwide.*
  • Graphite Crucible

    Graphite Crucible

    Semicorex Graphite Crucible with excellent properties is great applied in the smelting industry. Semicorex supplies high-quality customized products according to customers’ needs.*
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  • TSMC: 2nm process risk trial production next year

    In their newly released annual report, TSMC Chairman Deyin Liu and CEO Chieh-Jia Wei revealed the progress related to the 2nm process.

  • Porous Graphite for High Quality SiC Crystal Growth by PVT Method

    Silicon Carbide (SiC) has emerged as a key material in the field of semiconductor technology, offering exceptional properties that make it highly desirable for various electronic and optoelectronic applications. The production of high-quality SiC single crystals is crucial for advancing the capabilities of devices such as power electronics, LEDs, and high-frequency devices. In this article, we delve into the significance of porous graphite in the Physical Vapor Transport (PVT) method for 4H-SiC single crystal growth.

  • The Crucial Role of Epitaxial Layers in Semiconductor Devices

    Epitaxial growth refers to the process of growing a crystallographically well-ordered monocrystalline layer on a substrate. Generally speaking, epitaxial growth involves the cultivation of a crystal layer on a single-crystal substrate, with the grown layer sharing the same crystallographic orientation as the original substrate. Epitaxy is extensively utilized in semiconductor manufacturing, such as the production of epitaxial silicon wafers in the integrated circuit industry.

  • Understanding the Complete Semiconductor Device Fabrication Process

    The fabrication of semiconductor devices primarily encompasses four types of processes: (1) Photolithography (2) Doping Techniques (3) Film Deposition (4) Etching Techniques The specific techniques involved include photolithography, ion implantation, rapid thermal processing (RTP), plasma-enhanced chemical vapor deposition (PECVD), sputtering, and both dry and wet etching methods.

  • Technical Challenges in Silicon Carbide Crystal Growth Furnaces

    Silicon carbide (SiC) crystal growth furnaces are the cornerstone of SiC wafer production. While sharing similarities with traditional silicon crystal growth furnaces, SiC furnaces face unique challenges due to the material’s extreme growth conditions and complex defect formation mechanisms. These challenges can be broadly categorized into two areas: crystal growth and epitaxial growth.

  • What is Silicon Nitride

    Silicon nitride (Si3N4) is a key material in the development of advanced high-temperature structural ceramics.

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