English
Home > Products > SiC Etch Trays

China SiC Etch Trays Manufacturers, Suppliers, Factory

The shopper satisfaction is our primary focus on. We uphold a consistent level of professionalism, quality, credibility and repair for SiC Etch Trays,Etch Carrier(ICP/PSS),Silicon Etching Carrier,Silicon Carbide Etching Plate Holder,SiC Etching Substrate Holder, If you pursuit the Hi-quality, Hi-stable, Competitive price parts, company name is your best choice!
SiC Etch Trays, With the effort to keep pace with world's trend, we'll always endeavor to meet customers' demands. If you want develop any other new items, we can customize them to suit your needs. If you feel interest in any of our products and solutions or want develop new merchandise, you should feel free to contact us. We are looking forward to forming successful business relationship with customers all over the world.

Related Products

Hot Products

  • Half Parts for SiC Epitaxial Equipment

    Half Parts for SiC Epitaxial Equipment

    Semicorex Half Parts for SiC Epitaxial Equipment, is an advanced high-purity material on semiconductor processing. This crucial piece of equipment plays a pivotal role in the process of SiC wafer epitaxy. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Quartz Wafer Carrier

    Quartz Wafer Carrier

    Semicorex Quartz Wafer Carrier, designed to exceed industry standards and optimize your production processes. This meticulously crafted carrier is engineered with precision and reliability to meet the exacting demands of the semiconductor industry. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Solid SiC Etching Ring

    Solid SiC Etching Ring

    You can rest assured to buy Solid SiC Etching Ring from our factory. Semicorex provide high-quality reinforced carbon-carbon composite with customized service. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Graphite Single Silicon Pulling Tools

    Graphite Single Silicon Pulling Tools

    Semicorex Graphite Single Silicon Pulling Tools emerge as unsung heroes in the fiery crucible of crystal growth furnaces, where temperatures soar and precision reigns supreme. Their remarkable properties, honed through innovative manufacturing, make them essential for coaxing flawless single crystal silicon into existence.**
  • Monocrystalline Silicon Wafers

    Monocrystalline Silicon Wafers

    Monocrystalline silicon wafers, crafted by the excellent high-purity monocrystalline silicon, offer exceptional flatness, low defect density, and superior quality. Semicorex prioritizes customer needs and is committed to providing premium wafer solutions required for advanced semiconductor industry.
  • Single Crystal Silicon Showerhead

    Single Crystal Silicon Showerhead

    Single crystal silicon showerhead, known as the gas spray head or gas distribution plate or, is a widely used gas distribution device in semiconductor manufacturing processes for key process steps such as cleaning, etching and deposition. High-quality and cost-effective single crystal silicon showerhead is essential to improve the precision and quality of chip manufacturing in the semiconductor industry.
  • Related Blog
  • Reviews

  • LPE Apparatus

    In the realm of semiconductor device fabrication, the precise control of crystal growth is paramount for achieving high-quality and reliable devices. One technique that has played a pivotal role in this domain is Liquid-Phase Epitaxy (LPE).

  • Applications of Gallium Oxide Wafer

    Gallium oxide (Ga2O3) has emerged as a promising material for various applications, particularly in power devices and radio frequency (RF) devices. In this article, we explore the key opportunities and target markets for gallium oxide in these domains.

  • Heteroepitaxy of 3C-SiC: An Overview

    The development of 3C-SiC, a significant polytype of silicon carbide, reflects the continuous advancement of semiconductor material science. In the 1980s, Nishino et al. first achieved a 4 μm thick 3C-SiC film on a silicon substrate using chemical vapor deposition (CVD)[1], laying the foundation for 3C-SiC thin-film technology.

  • What is Thermal Field?

    In the field of single crystal growth, the temperature distribution within the crystal growth furnace plays a critical role. This temperature distribution, commonly referred to as the thermal field, is a vital factor that influences the quality and characteristics of the crystal being grown. The thermal field can be categorized into two types: static and dynamic.

  • Surface Polishing of Silicon Wafers

    Silicon wafer surface polishing is a crucial process in semiconductor manufacturing. Its primary goal is to achieve extremely high standards of surface flatness and roughness by removing micro-defects, layers of stress damage, and contamination from impurities such as metal ions.

  • How is Silicon Carbide Manufactured?

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept