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We know that we only thrive if we can guarantee our combined rate competiveness and good quality advantageous at the same time for high temperature seal,graphite foil price,graphite foil sheet,flexible graphite,graphite foil uses, Many years of work experience, we have realized the importance of providing good quality products and the best before-sales and after-sales services.
high temperature seal, All of our solutions comply with international quality standards and are greatly appreciated in a variety of markets around the world. If you are interested in any of our products or would like to discuss a custom order, be sure to feel free to contact us. We've been looking forward to forming successful business relationships with new clients in the near future.

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  • Inductively-Coupled Plasma (ICP)

    Inductively-Coupled Plasma (ICP)

    Semicorex's silicon carbide coated susceptor for Inductively-Coupled Plasma (ICP) is designed specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers ensure even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.
  • Si Dummy Wafer

    Si Dummy Wafer

    Semicorex Si Dummy Wafer, crafted from either monocrystalline or polycrystalline silicon, shares the same foundational material as production wafers. Its similar thermal and mechanical properties are ideal for simulating real production conditions without the associated costs.
  • MOCVD Vacuum Chamber Lid

    MOCVD Vacuum Chamber Lid

    MOCVD Vacuum Chamber Lid used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex Silicon Carbide Coated MOCVD Vacuum Chamber Lid engineered specifically stand up to these challenging environments. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
  • CFC Rod

    CFC Rod

    Semicorex CFC Rod is specially designed for use in load-bearing applications, such as shafts in high-temperature vacuum furnaces and specialized atmosphere ovens.
  • Wafer Edge Grinding Chuck

    Wafer Edge Grinding Chuck

    Semicorex Wafer Edge Grinding Chuck is a ceramic disk made from high-purity white alumina, designed for wafer edge grinding in semiconductor manufacturing. Choosing Semicorex ensures superior material quality, precision engineering, and reliable performance that support the most demanding wafer processing environments.*
  • Graphite Ion Implanter

    Graphite Ion Implanter

    Semicorex Graphite Ion Implanter stands as a critical component in the realm of semiconductor manufacturing, distinguished by its fine particle composition, excellent conductivity, and resilience to extreme conditions.
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  • What is isostatic graphite?

    Specialty graphite is graphite with carbon mass fraction greater than 99.99%, also known as "three high graphite" (high strength, high density, high purity). It is characterized by high strength, high density, high purity, high chemical stability, high thermal and electrical conductivity, high temperature resistance, radiation resistance, strong lubrication and easy processing. Isostatic graphite belongs to specialty graphite.

  • Ceramic Heaters

    In the front-end process (FEOL) of semiconductor manufacturing, the wafer needs to be subjected to various process treatments, especially the wafer needs to be heated to a certain temperature, and there are strict requirements, because the uniformity of temperature has a very important impact on the product yield; at the same time, semiconductor equipment needs to work in the presence of vacuum, plasma and chemical gases, which requires the use of ceramic heaters.

  • MOCVD is the key equipment

  • Epitaxial Layers: The Foundation of Advanced Semiconductor Devices

    In the semiconductor industry, epitaxial layers play a crucial role by forming specific single-crystal thin films atop a wafer substrate, collectively known as epitaxial wafers. Particularly, silicon carbide (SiC) epitaxial layers grown on conductive SiC substrates produce homogenous SiC epitaxial wafers, which are instrumental in the fabrication of power devices such as Schottky diodes, MOSFETs, and IGBTs, with 4H-SiC substrates being the most widely utilized.

  • Why does quartz need to be annealed

    According to processing method, use, and appearance, quartz glass is classified into two categories: transparent and opaque. The transparent category includes types such as fused transparent quartz glass, fused quartz glass, gas-refined transparent quartz glass, and synthetic quartz glass.

  • What is P-type SiC wafer?

    A P-type silicon carbide (SiC) wafer is a semiconductor substrate that is doped with impurities to create a P-type (positive) conductivity. Silicon carbide is a wide-bandgap semiconductor material that offers exceptional electrical and thermal properties, making it suitable for high-power and high-temperature electronic devices.

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