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    The Semicorex Silicon Carbide Wafer Chuck is an essential component in the semiconductor epitaxial process. It serves as a vacuum chuck to securely hold wafers during critical manufacturing stages. We are committed to delivering top-quality products at competitive prices, positioning ourselves to be your long-term partner in China.*
  • Wafer Holder

    Wafer Holder

    Semicorex wafer holder iS critical component in semiconductor manufacturing and play a key role in ensuring accurate and efficient handling of wafers during the epitaxy process. We are firmly committed to providing the highest quality products at competitive prices and look forward to starting a business with you.*
  • TaC Coating Plate

    TaC Coating Plate

    Semicorex TaC Coating Plate stands out as a high-performance component for demanding epitaxial growth process and further semiconductor manufacturing environments.With its series of superior properties,it can ultimately enhance the productivity and cost-effectiveness of advanced semiconductor fabrication processes.**
  • TaC Plate

    TaC Plate

    Semicorex TaC Plate is a high-performance, TaC-coated graphite component designed for use in SiC epitaxy growth processes. Choose Semicorex for its expertise in manufacturing reliable, high-quality materials that optimize the performance and longevity of your semiconductor production equipment.*
  • SiC Pipes

    SiC Pipes

    Semicorex SiC Pipes are high-performance silicon carbide ceramic components designed for semiconductor furnace applications, delivering exceptional thermal, mechanical, and chemical stability in demanding process environments. Choose Semicorex for precision-engineered SiC pipes that ensure consistent quality, extended service life, and maximum furnace efficiency.*
  • Graphite Bearings

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    Semicorex graphite bearings has the great advantages on self-lubricating, high-temperature resistance, corrosion resistance, light, etc. It is widely applied in various industries for machine running. Semicorex is committed in supplying qualified products to support our customers.*
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  • What is isostatic graphite?

    Isostatic graphite is a type of graphite with an ultra-fine grain. It is used for applications where the mechanical properties of other fine-grained graphites are inadequate.

  • Porous Graphite for High Quality SiC Crystal Growth by PVT Method

    Silicon Carbide (SiC) has emerged as a key material in the field of semiconductor technology, offering exceptional properties that make it highly desirable for various electronic and optoelectronic applications. The production of high-quality SiC single crystals is crucial for advancing the capabilities of devices such as power electronics, LEDs, and high-frequency devices. In this article, we delve into the significance of porous graphite in the Physical Vapor Transport (PVT) method for 4H-SiC single crystal growth.

  • Heteroepitaxy of 3C-SiC: An Overview

    The development of 3C-SiC, a significant polytype of silicon carbide, reflects the continuous advancement of semiconductor material science. In the 1980s, Nishino et al. first achieved a 4 μm thick 3C-SiC film on a silicon substrate using chemical vapor deposition (CVD)[1], laying the foundation for 3C-SiC thin-film technology.

  • The Study on the Distribution of Electrical Resistivity in n-Type 4H-SiC Crystals

    4H-SiC, as a third-generation semiconductor material, is renowned for its wide bandgap, high thermal conductivity, and excellent chemical and thermal stability, making it highly valuable in high-power and high-frequency applications.

  • The Fusion of AI and Physics: CVD Technological Innovation Behind the Nobel Prize

    The recent announcement of the 2024 Nobel Prize in Physics has brought unprecedented attention to the field of artificial intelligence.

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