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China Alumina Sucking Plate Manufacturers, Suppliers, Factory

Our solutions are greatly recognized and reliable by customers and will fulfill continuously altering financial and social requirements for Alumina Sucking Plate,Porous Vacuum Chuck,Porous Ceramic Plate,Alumina Ceramic Vacuum Plate,Al2O3 Alumina Porous Ceramic, Our enterprise warmly welcome close friends from everywhere in the environment to go to, examine and negotiate organization.
Alumina Sucking Plate, At Current, our solutions have been exported to more than sixty countries and different regions, such as Southeast Asia, America, Africa, Eastern Europe, Russia, Canada etc. We sincerely hope to establish wide contact with all potential customers both in China and the rest part of the world.

Hot Products

ICP Plasma Etching Plate
Semicorex's ICP Plasma Etching Plate provides superior heat and corrosion resistance for wafer handling and thin film deposition processes. Our product is engineered to withstand high temperatures and harsh chemical cleaning, ensuring durability and longevity. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.
ICP Plasma Etching System
Semicorex's SiC Coated carrier for ICP Plasma Etching System is a reliable and cost-effective solution for high-temperature wafer handling processes such as epitaxy and MOCVD. Our carriers feature a fine SiC crystal coating that provides superior heat resistance, even thermal uniformity, and durable chemical resistance.
Silicon Carbide Coating Graphite Susceptor for MOCVD
Semicorex is a trusted supplier and manufacturer of silicon carbide coating graphite susceptor for MOCVD. Our product is specially designed to cater to the needs of the semiconductor industry in growing the epitaxial layer on the wafer chip. The product is used as the center plate in MOCVD, with a gear or ring-shaped design. It has high heat and corrosion resistance, making it ideal for use in extreme environments.
Susceptor Plate
Semicorex Susceptor Plate is a crucial component in the epitaxial growth process, specifically designed to carry semiconductor wafers during the deposition of thin films or layers. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
Tantalum Carbide Coated Porous Graphite
Semicorex Tantalum Carbide Coated Porous Graphite is the latest innovation in Silicon Carbide (SiC) crystal growth technology. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China*.
LPE Halfmoon Reaction Chamber
Semicorex LPE Halfmoon Reaction Chamber is indispensable for the efficient and reliable operation of SiC epitaxy, ensuring the production of high-quality epitaxial layers while reducing maintenance costs and increasing operational efficiency. **

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China Alumina Sucking Plate Manufacturers, Suppliers, Factory

Related Products

Hot Products

ICP Plasma Etching Plate

ICP Plasma Etching System

Silicon Carbide Coating Graphite Susceptor for MOCVD

Susceptor Plate

Tantalum Carbide Coated Porous Graphite

LPE Halfmoon Reaction Chamber

What are epitaxial wafers used for?

Japan recently restricted exports of 23 types of semiconductor manufacturing equipment

TSMC: 2nm process risk trial production next year

Main steps in SiC substrate processing

What Applications of Gallium Nitride (GaN) Substrate?

The Study on Reaction-Sintered SiC Ceramics and Their Properties

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