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Semiconductor Wafer Handling Equipment, We give good quality but unbeatable low price and the best service. Welcome to post your samples and color ring to us .We are going to produce the items according to your request. If you are interested in any solutions we provide, remember to feel free to contact us directly by mail, fax, telephone or internet. We have been here to answer your questions from Monday to Saturday and looking forward to cooperating with you.

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  • Spare Parts in Epitaxial Growth

    Spare Parts in Epitaxial Growth

    Semicorex Spare Parts in Epitaxial Growth are crucial components utilized within epitaxial growth systems, particularly in processes involving quartz tube setups. These parts play a vital role in facilitating gas flow to drive tray base rotation and ensure precise temperature control throughout the epitaxial growth process. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Alumina Ceramic Wafer Chucks

    Alumina Ceramic Wafer Chucks

    Semicorex Alumina Ceramic Wafer Chucks not limited to a single industry; their unique properties make them suitable for a wide range of applications. In the semiconductor sector, they are used for holding wafers during chip fabrication. In the chemical industry, their corrosion resistance makes them ideal for handling aggressive substances. Environmental applications benefit from their stability and resistance to wear, while their mechanical properties are leveraged in the development of functional materials.We at Semicorex are dedicated to manufacturing and supplying high-performance Alumina Ceramic Wafer Chucks that fuse quality with cost-efficiency.
  • Porous SiC Plate

    Porous SiC Plate

    Semicorex Porous SiC Plate is an advanced ceramic material designed for high-precision applications, offering superior mechanical strength, thermal stability, and chemical resistance. *
  • Satellite Plate

    Satellite Plate

    Semicorex Satellite Plate is a critical component used in semiconductor epitaxy reactors, specifically designed for Aixtron G5+ equipment. Semicorex combines advanced material expertise with cutting-edge coating technology to deliver reliable, high-performance solutions tailored for demanding industrial applications.*
  • CCB Brakes

    CCB Brakes

    Semicorex CCB Brakes (Carbon-Ceramic Brakes with Coated Friction Layer) represent the next generation of high-performance braking solutions, engineered for extreme durability, thermal stability, and consistent braking under the most demanding conditions. Choose Semicorex for its expertise in advanced ceramic composites and precision-engineered coating technologies.*
  • Quartz Thermos Containers

    Quartz Thermos Containers

    Crafted by high-purity quartz material, Semicorex quartz thermos containers are essential components to provide support and insulation for silicon wafer carriers in semiconductor manufacturing processes to maintain stability in high-temperature environments. It is widely used in diffusion, oxidation and annealing processes in the advanced semiconductor production. Their quality directly affects the yield of silicon wafer and chip performance.
  • Related Blog
  • Reviews

  • Chip shortage continues to be a problem

    While there is currently an oversupply of memory semiconductors due to a sluggish global economy, analog chips for automotive and industrial applications remain in short supply. Lead times for these analog chips can be as long as 40 weeks, compared to around 20 weeks for memory stocks.

  • Thermal field insulation material

    The process of monocrystalline silicon growth predominantly occurs within a thermal field, where the quality of the thermal environment significantly impacts crystal quality and growth efficiency. The design of the thermal field plays a pivotal role in shaping temperature gradients and gas flow dynamics within the furnace chamber. Furthermore, the materials used in constructing the thermal field directly influence its lifespan and performance.

  • Ion Implant and Diffusion Process

    Ion implantation is a method of semiconductor doping and one of the main processes in semiconductor manufacturing.

  • Why Doesn’t Gllium Nitride (GaN) Epitaxy Grow on a GaN substrate?

    The growth of GaN epitaxy on GaN substrate presents a unique challenge, despite the material’s superior properties when compared to silicon. GaN epitaxy offers significant advantages in terms of band gap width, thermal conductivity, and breakdown electric field over silicon-based materials. This makes the adoption of GaN as the backbone for the third generation of semiconductors, which provide enhanced cooling, lower conduction loss, and improved performance under high temperatures and frequencies, a promising and crucial advancement for the photonic and micro-electronic industries.

  • Application of SiC and GaN in electric vehicles

    SiC MOSFETs are transistors that offer high power density, improved efficiency, and low failure rates at high temperatures. These advantages of SiC MOSFETs bring numerous benefits to electric vehicles (EVs), including longer driving range, faster charging, and potentially lower cost battery electric vehicles (BEVs). Over the past five years, SiC MOSFETs have been widely used in the power electronics of EVs in vehicles from OEMs such as Tesla and Hyundai. In fact, SiC inverters accounted for 28% of the BEV market in 2023.

  • Why Use Ultrasonic Cleaning in Semiconductor Manufacturing

    When cleaning wafers, ultrasonic cleaning and megasonic cleaning are commonly used to remove particles from the wafer surface.

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