China MOCVD Chamber Lids Manufacturers, Suppliers, Factory

Our solutions are broadly acknowledged and dependable by users and may meet consistently developing economic and social requires for MOCVD Chamber Lids,MOCVD Ceiling Plate,MOCVD Cover Plate,Silicon Carbide Ceramic Lid,Graphite Ceiling, Thanks for taking your useful time to go to us and look ahead to have a nice cooperation with you.
MOCVD Chamber Lids, We insist on "Quality First, Reputation First and Customer First". We are committed to providing high-quality items and good after-sales services. Up to now, our solutions have been exported to more than 60 countries and areas around the world, such as America, Australia and Europe. We enjoy a high reputation at home and abroad. Always persisting in the principle of "Credit, Customer and Quality", we expect cooperation with people in all walks of life for mutual benefits.

Hot Products

  • Silicon Carbide-Coated Graphite Barrel

    Silicon Carbide-Coated Graphite Barrel

    The Semicorex Silicon Carbide-Coated Graphite Barrel is the perfect choice for semiconductor manufacturing applications that require high heat and corrosion resistance. Its exceptional thermal conductivity and heat distribution properties make it ideal for use in LPE processes and other high-temperature environments.
  • Process Tube for Diffusion Furnaces

    Process Tube for Diffusion Furnaces

    Semicorex process tube for diffusion furnaces is a specialized component used in the manufacturing of semiconductor devices. It is designed to provide a controlled environment for diffusion processes, where impurities are introduced into the semiconductor wafers to modify their electrical properties. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • SiC Multi Pocket Susceptor

    SiC Multi Pocket Susceptor

    Semicorex SiC Multi Pocket Susceptor represents a critical enabling technology in the epitaxial growth of high-quality semiconductor wafers. Fabricated through a sophisticated Chemical Vapor Deposition (CVD) process, these susceptors provide a robust and high-performance platform for achieving exceptional epitaxial layer uniformity and process efficiency.**
  • SiC Disc Susceptor

    SiC Disc Susceptor

    Semicorex introduces its SiC Disc Susceptor, designed to elevate the performance of Epitaxy, Metal-Organic Chemical Vapor Deposition (MOCVD), and Rapid Thermal Processing (RTP) equipment. The meticulously engineered SiC Disc Susceptor provides with properties that guarantee superior performance, durability, and efficiency in high-temperature and vacuum environments.**
  • Silicon Carbide Tray

    Silicon Carbide Tray

    Semicorex Silicon Carbide Tray is built to withstand extreme conditions while ensuring remarkable performance. It plays a crucial role in the ICP etching process, semiconductor diffusion, and the MOCVD epitaxial process.
  • Silicon Carbide Flat Membrane

    Silicon Carbide Flat Membrane

    Semicorex Silicon Carbide Flat Membrane is a high-performance ceramic filtration solution renowned for its exceptional chemical resistance, thermal stability, and superior filtration efficiency. Choosing Semicorex means opting for industry-leading technology backed by cutting-edge manufacturing processes and a commitment to delivering reliable, cost-effective solutions that meet the toughest filtration challenges.*

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