China ICP Etching Carrier Manufacturers, Suppliers, Factory

You can rest assured to buy ICP Etching Carrier from our factory and we will offer you the best after-sale service and timely delivery. Semicorex wafer susceptor is made of silicon carbide coated graphite using the chemical vapor deposition (CVD) process. This material possesses unique properties, including high temperature and chemical resistance, excellent wear resistance, high thermal conductivity, and high strength and stiffness. These properties make it an attractive material for various high-temperature applications, including Inductively Coupled Plasma(ICP) Etching systems.

We provide customized servise, help you innovate with components that last longer, reduce cycle times, and improve yields.

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ICP Plasma Etching Tray

Semicorex's ICP Plasma Etching Tray is engineered specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers provide even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.

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ICP Plasma Etching System

Semicorex's SiC Coated carrier for ICP Plasma Etching System is a reliable and cost-effective solution for high-temperature wafer handling processes such as epitaxy and MOCVD. Our carriers feature a fine SiC crystal coating that provides superior heat resistance, even thermal uniformity, and durable chemical resistance.

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Inductively-Coupled Plasma (ICP)

Semicorex's silicon carbide coated susceptor for Inductively-Coupled Plasma (ICP) is designed specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers ensure even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.

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ICP Etching Wafer Holder

Semicorex's ICP etching wafer holder is the perfect solution for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers ensure even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.

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ICP Etching Carrier Plate

Semicorex's ICP Etching Carrier Plate is the perfect solution for demanding wafer handling and thin film deposition processes. Our product provides superior heat and corrosion resistance, even thermal uniformity, and laminar gas flow patterns. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.

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Wafer Holder for ICP Etching Process

Semicorex's Wafer Holder for ICP Etching Process is the perfect choice for demanding wafer handling and thin film deposition processes. Our product boasts superior heat and corrosion resistance, even thermal uniformity, and optimal laminar gas flow patterns for consistent and reliable results.

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Semicorex has been producing ICP Etching Carrier for many years and is one of the professional ICP Etching Carrier manufacturers and Suppliers in China. Once you buy our advanced and durable products which supply bulk packing, we guarantee the large quantity in quick delivery. Over the years, we have provided customers with customized service. Customers are satisfied with our products and excellent service. We sincerely look forward to becoming your reliable long-term business partner! Welcome to buy products from our factory.