SiC Inlet Rings
  • SiC Inlet RingsSiC Inlet Rings

SiC Inlet Rings

Semicorex SiC Inlet Rings are high-performance silicon carbide components engineered for semiconductor processing equipment, offering exceptional thermal stability, chemical resistance, and precision machining. Choosing Semicorex means gaining access to reliable, customized, and contamination-free solutions trusted by leading semiconductor manufacturers.*

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Product Description

Semicorex SiC Inlet Rings are vital components in semiconductor processing systems, especially in epitaxial reactors and deposition equipment where gas uniformity and process stability affect wafer processing, along with quality and device performance. SiC Inlet Rings are designed to control the inlet of process gases, stabilizing inlet conditions accurate while providing uniform gas flow over the wafer surfaces with respect to temperature and chemical reactivity during processing, especially at elevated temperatures. SiC Inlet Rings are manfactured from extremely high-purity silicon carbide (SiC), allowing them to be resilient to thermal shock, resistance to corrosion, and little to no particle generation - an essential component in advanced semiconductor fabrication.


The chief advantage of silicon carbide as a material is the ability to experience extreme thermal conditions. In the case of epitaxial growth and other semiconductor processes, the reactors hold sustained high temperature levels that can exceed that of traditional materials. SiC Inlet Rings are able to thermally tolerate after such sustained temperatures, with no deformation and particularly no warpage. They are able to keep the dimensionality stable to avoid disruption of the flow uniformity of the gases. Further, the temperature resistance of SiC Inlet Rings provides uniform conditions of the processes over long operational cycles. This factor is valuable for high volume manufacturing as well as device manufacturing.


Chemical resistance, in addition to thermal stability, is another important quality of SiC Inlet Rings. Semiconductor processes can involve reactive gases such as silane, hydrogen, and ammonia or involve uses of some chlorine-based chemistries. Materials that corrode or degrade when exposed to reactive gases can cause contamination of wafers upon first exposure and eventually leads to an efficiency loss of a process. SiC provides high resistance to chemical attack, maintaining an inert surface which preserves radical cleanliness, prevents particle-type contamination, and extends the service life of the inlet ring, while maintaining integrity of the wafer, leading to higher yields and lowered defects.


Machining precision is another vital consideration in the performance of an inlet ring. The geometry of the ring is critical in controlling the flow characteristics of the process gases. Slight inconsistencies lead to uneven distributions of gases and lead to non-uniform film growth or doping characteristics across wafers. SiC Inlet Rings are produced using precision techniques, achieving close tolerances, good flatness, and excellent surface finishes. The precision aspect of the inlet rings ensures repeatable, uniform delivery of gases to the process chamber, which directly affects process control of wafers.


Customization is another significant advantage of SiC Inlet Rings. Due to the differing designs of semiconductor equipment and processes, each application requires a different component to be properly accommodated. SiC Inlet Rings can be manufactured in a variety of sizes, shapes, and types, thereby meeting the needs of different reactor models and applications. Performance can be further improved using various surface treatments and polishing for optimal performance, giving customers a unique solution tailor to their production environment.


In addition to technical benefits, SiC Inlet Rings have operational and economic benefits. The durability against thermal and chemical stresses means fewer replacements and lower maintenance costs which translates to less downtime and consumables. When trying to maximize throughput and increase efficiency in a semiconductor fab, SiC Inlet Rings offer a long-term cost-effective solution, while maintaining process quality.


Semicorex SiC Inlet Rings combine advanced properties of silicon carbide material with engineered precision to deliver enhanced performance for semiconductor manufacturing applications. Featuring high thermal-resistance, outstanding chemical stability, and precision machining, SiC Inlet Rings are designed to offer reliability in gas flow control for high-tech applications with long-term durability. Contamination-free and customizable, SiC Inlet Rings are a key component for fabs that want to maintain process stability, high efficiency, and yield for devices. By selecting SiC Inlet Rings from Semicorex, semiconductor manufacturers are working with a proven solution designed to meet the demands of the toughest processes in semiconductor manufacturing.


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