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Quartz Susceptor Support
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Quartz Susceptor Support

Semicorex Quartz Susceptor Support is designed specifically for semiconductor epitaxial furnaces. Its high-purity materials and precise structure enable accurate lifting and positioning control of trays or sample holders within the reaction chamber. Semicorex can provide customized high-purity quartz solutions, ensuring long-term performance stability of every support component in the high-vacuum, high-temperature, and highly corrosive semiconductor process environments through advanced processing technology and stringent quality control.*

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Product Description

In the rigorous environment of semiconductor manufacturing, the difference between a high-yield batch and a costly failure often lies in the microscopic precision of wafer positioning. Semicorex Quartz Susceptor Support Shaft (commonly referred to as an Epitaxial Quartz Shaft) serves as the literal backbone of the chemical vapor deposition (CVD) and epitaxial growth processes. Engineered to withstand extreme thermal gradients and chemical exposure, this component is critical for the fluid, vertical movement and rotation of susceptors or wafer carriers.


The Role of Quartz in Epitaxial Processes

The epitaxial process requires temperatures often exceeding 1000°C and an environment free of even the slightest metallic contamination. Standard materials would fail or outgas under these conditions. Our Quartz Susceptor Support is manufactured from ultra-high-purity synthetic fused silica, ensuring:


Exceptional Thermal Stability: High resistance to thermal shock, preventing cracking during rapid heating and cooling cycles.

Chemical Inertness: Non-reactive with precursor gases and cleaning agents, maintaining the integrity of the semiconductor wafer.

Minimal Contamination: With impurity levels measured in parts per million (ppm), it prevents "doping" the atmosphere with unwanted elements.

quartz machined

Core Functions & Technical Advantages

The primary function of the Quartz Susceptor Support is to facilitate the vertical and rotational movement of the susceptor—the plate that holds the semiconductor wafer.


1. Precision Vertical Positioning

In a typical reactor, the distance between the wafer surface and the gas inlet determines film uniformity. Our quartz shafts are machined to sub-millimeter tolerances. This allows the equipment's motion control system to raise or lower the susceptor with absolute repeatability, ensuring that every wafer in a production run experiences identical gas-flow dynamics.


2. Seamless Motion and Transfer

Efficiency in high-volume manufacturing (HVM) depends on the speed of wafer handling. The sheet-type design and reinforced structural ribs of the support shaft ensure that it can carry the weight of heavy graphite or silicon carbide (SiC) coated susceptors without bowing or vibrating. This stability is essential for the rapid transfer of samples between different processing chambers or workstations, minimizing downtime.


3. Optimized Thermal Insulation

While the susceptor must be hot, the mechanical components below often need to stay cooler. Quartz acts as a natural thermal insulator. The hollow, tube-like structure of the shaft reduces the heat conduction path, protecting the motor and vacuum seals located at the base of the reactor.


Property
Value
Material
High-Purity Fused Quartz (SiO2 > 99.99%)
Operating Temp
Up to 1200°C (Continuous)
Surface Finish
Polished
Design Type
Three-pronged Susceptor Support / Shaft-Type
Application
MOCVD, CVD, Epitaxy, and Diffusion Furnaces

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