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    In their newly released annual report, TSMC Chairman Deyin Liu and CEO Chieh-Jia Wei revealed the progress related to the 2nm process.

  • What is the advantage of silicon carbide?

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    Chemical vapor deposition (CVD) is a coating technology that uses gaseous or vaporous substances to undergo chemical reactions in the gas phase or at a gas-solid interface to generate solid substances that are deposited on the substrate surface, thereby forming high-performance solid films. The core of CVD is to transport gaseous precursors into a reaction chamber, where chemical reactions generate solid products that are deposited on the substrate, and by-product gases are exhausted from the system.

  • Oxidation in Semiconductor Processing

    Oxidation processes play a critical role in preventing such problems by creating a protective layer on the wafer, known as the oxide layer, which acts as a barrier between different chemicals.

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    According to the research results, TaC coating can act as a protection and isolation layer to extend graphite component life, improve radial temperature uniformity, maintain SiC sublimation stoichiometry, suppress impurity migration, and reduce energy consumption. Ultimately a TaC-coated graphite crucible set is expected to improve SiC PVT process control and product quality.

  • Introducing Silicon Material

    Silicon is the second most abundant element on Earth after oxygen. Most silicon is found in soil, rocks, natural water, trees, and plants.

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