Silicon Etching Rings

Silicon etching rings are the essential components within the plasma etch chamber of CCP/ICP etch equipment and are typically placed around the semiconductor wafer. Their primary functions are to support the semiconductor wafer, maintain uniform plasma distribution, protect the wafer edge, and thus help create optimal operating conditions for the plasma etching process.

Advantages of Semicorex silicon etching rings

1. Premium material selection

Semicorex silicon etching rings are manufactured from the carefully selected high-purity MCZ monocrystalline silicon, which offers the following excellent properties over conventional CZ monocrystalline silicon.

High purity: The purity is over 99.9999999%, which means Semicorex silicon etching rings contains almost no impurities. This ultra-high purity can effectively avoid the interference from component impurities during the etching process, thereby guaranteeing high etching precision.

Stable structure: MCZ monocrystalline silicon features a superior crystal structure with lower defects than conventional CZ monocrystalline silicon. This stable crystal structure gives Semicorex silicon etching rings enhanced corrosion resistance to plasma corrosion and enable them to withstand harsh etching operating conditions.

Excellent resistivity uniformity: Semicorex silicon etching rings deliver exceptional resistance uniformity with RRG < 5%. Low Res. (<0.02 Ω·cm), Middle Res. (0.2–25 Ω·cm), High Res. (>100 Ω·cm). This excellent resistivity uniformity can minimize uneven plasma distribution caused by excessively high or low resistivity, which contributes to an ideal electric field for high-precision plasma etching.

2. Precision processing and strict quality inspection

Semicorex boasts an experienced technical team that can provide personalized customization and technical evaluations for our valued customers and has also established systematic processing and inspection procedures to guarantee product quality.

Flexible customization services: Semicorex supports customization based on customer drawings, and the maximum custom diameter of silicon etching rings can be up to 470mm.

High-standard surface treatment: Polishing precision can be strictly controlled within Ra < 0.1 µm, and fine grinding achieves a surface finish of Ra > 0.1 µm.

Strict quality inspection: The dimensional measurement, resistivity testing, and visual inspection will be taken to ensure silicon etching rings are free from chips, scratches, cracks, stains and other defects.