SiC Barrel for Silicon Epitaxy

Semicorex SiC Barrel For Silicon Epitaxy is a engineered to meet the demanding requirements of Applied Materials and LPE units. Crafted with precision and innovation, this barrel-shaped susceptor is manufactured from high-quality SiC-coated graphite, ensuring exceptional performance and durability in silicon epitaxy applications. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.

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Product Description

Semicorex SiC Barrel For Silicon Epitaxy is constructed using graphite material coated with Silicon Carbide (SiC). This unique construction ensures excellent resistance to thermal shocks and chemical degradation, prolonging the lifespan of the susceptor and maintaining process reliability.

The advanced SiC coating on SiC Barrel For Silicon Epitaxy provides superior thermal conductivity and heat distribution, promoting uniform temperature profiles throughout the susceptor. This enhances process control, minimizes thermal gradients, and ensures consistent epitaxial layer growth, resulting in high-quality silicon films with exceptional uniformity and purity.

Our SiC Barrel For Silicon Epitaxy can be customized to meet specific requirements and preferences. From size adjustments to coating thickness variations, we offer flexibility in design to accommodate various process parameters and optimize performance for specific applications.

Our SiC Barrel For Silicon Epitaxy offers reliability and longevity, reducing downtime and maintenance costs associated with frequent replacements. Its robust construction and exceptional performance contribute to improved process efficiency, ultimately enhancing productivity and cost-effectiveness for semiconductor manufacturing operations.