English
Home > Products > pecvd silicon nitride

China pecvd silicon nitride Manufacturers, Suppliers, Factory

With our loaded working experience and thoughtful products and services, we've got been acknowledged as a reputable supplier for most international buyers for pecvd silicon nitride,silicon nitride ceramic,silicon nitride,si3n4,si3n4 ceramic, Accurate process devices, Advanced Injection Molding Equipment, Equipment assembly line, labs and software progress are our distinguishing feature.
pecvd silicon nitride, Our tenet is "integrity first, quality best". We now have confidence in providing you with excellent service and ideal goods. We sincerely hope we can establish win-win business cooperation with you in the future!

Related Products

Hot Products

  • CVD Silicon Carbide Showerhead

    CVD Silicon Carbide Showerhead

    Semicorex CVD Silicon Carbide Showerhead is an essential and highly specialized component in the semiconductor etching process, particularly in the manufacturing of integrated circuits. With our unwavering commitment to delivering top-quality products at competitive prices, we are poised to become your long-term partner in China.*
  • Silicon Carbide Cantilever Paddle

    Silicon Carbide Cantilever Paddle

    Semicorex silicon carbide cantilever paddle is a specialized component used in furnaces for various thermal processing applications. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Batch Wafer Boat

    Batch Wafer Boat

    Semicorex provides wafer boats, pedestals, and custom wafer carriers for both vertical / column and horizontal configurations. We have been manufacturer and supplier of silicon carbide coating film for many years. Our Batch Wafer Boat has a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
  • SiC Membranes

    SiC Membranes

    Semicorex SiC membranes are high-performance ceramic filtration solutions designed to meet the most demanding industrial applications with exceptional durability, chemical resistance, and thermal stability. As a leader in advanced material technology, Semicorex continues to push the boundaries of innovation, delivering superior-quality SiC membranes that set new industry standards.*
  • TaC Coated Graphite Chuck

    TaC Coated Graphite Chuck

    Semicorex TaC Coated Graphite Chuck is a high-performance component designed for precise wafer handling and high-temperature processes in semiconductor manufacturing. Choose Semicorex for its innovative, durable products that ensure optimal performance and longevity in demanding semiconductor applications.*
  • SiC Coated Wafer Carriers

    SiC Coated Wafer Carriers

    Semicorex SiC Coated Wafer Carriers are high-purity graphite susceptors coated with CVD silicon carbide, designed for optimal wafer support during high-temperature semiconductor processes. Choose Semicorex for unmatched coating quality, precision manufacturing, and proven reliability trusted by leading semiconductor fabs worldwide.*
  • Related Blog
  • Reviews

  • Main steps in SiC substrate processing

    The processing of 4H-SiC substrate mainly includes the following steps:

  • Chip Manufacturing: Thin Film Processes

    The semiconductor thin film deposition process is an essential component of modern microelectronics technology. It involves constructing complex integrated circuits by depositing one or more thin layers of material on a semiconductor substrate.

  • Silicon Wafer

    Silicon material is a solid material with certain semiconductor electrical properties and physical stability, and provides substrate support for the subsequent integrated circuit manufacturing process. It is a key material for silicon-based integrated circuits. More than 95% of semiconductor devices and more than 90% of integrated circuits in the world are made on silicon wafers.

  • What is Semiconductor Ion Implantation Technology?

    In semiconductor manufacturing, ion implantation involves using high-energy accelerators to inject specific impurity atoms, such as arsenic or boron, into a silicon substrate.

  • Technical Challenges in Silicon Carbide Crystal Growth Furnaces

    Silicon carbide (SiC) crystal growth furnaces are the cornerstone of SiC wafer production. While sharing similarities with traditional silicon crystal growth furnaces, SiC furnaces face unique challenges due to the material’s extreme growth conditions and complex defect formation mechanisms. These challenges can be broadly categorized into two areas: crystal growth and epitaxial growth.

  • Annealing

    Annealing after ion implantation is a key step in semiconductor device manufacturing, which affects the performance and reliability of the device.

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept