> Products > Reactive Ion Etching Ring

China Reactive Ion Etching Ring Manufacturers, Suppliers, Factory

"Based on domestic market and expand abroad business" is our enhancement strategy for Reactive Ion Etching Ring,Etch Ring,Silicon Carbide Etching Ring,Plasma Etching Ring,Dry Etching Ring, In our efforts, we already have many shops in China and our products have won praise from customers worldwide. Welcome new and old customers to contact us for the future long term business relationships.
Reactive Ion Etching Ring, With the growing of the company, now our items sold and served at more than 15 countries around the world,such as Europe,North America,Middle-east,South America,Southern Asia and so on. As we bear in our mind that innovation is essential to our growth, new product development is constantly.Besides, Our flexible and efficient operation strategies,High quality products and solutions and competitive prices are exactly what our customers are looking for. Also a considerable service brings us good credit reputation.

Hot Products

Graphite Top Plates
Semicorex Graphite Top Plates are precision-engineered fixtures designed for secure and reliable handling of hot glass bottles in high-temperature manufacturing environments. Choose Semicorex for unmatched material quality, custom machining capabilities, and consistent performance trusted by leading glass producers worldwide.*
Bulk SiC Ring
Semicorex Bulk SiC Ring is a crucial component in semiconductor etching processes, specifically designed for use as an etching ring within advanced semiconductor manufacturing equipment. With our steadfast commitment to providing top-quality products at competitive prices, we are ready to become your long-term partner in China.*
Wafer Loader Arm
Semicorex Wafer Loader Arm's ability to withstand extreme conditions while maintaining exceptional performance underscores its value in optimizing manufacturing processes and achieving higher levels of productivity and quality.The integration of high-purity alumina ceramic material ensures superior cleanliness, precision, and durability.**
PSS Etching Carrier Tray for Wafer Processing
Semicorex's PSS Etching Carrier Tray for Wafer Processing is specifically designed for the demanding epitaxy equipment applications. Our ultra-pure graphite carrier is ideal for thin-film deposition phases like MOCVD, epitaxy susceptors, pancake or satellite platforms, and wafer handling processing such as etching. The PSS Etching Carrier Tray for Wafer Processing has high heat and corrosion resistance, excellent heat distribution properties, and a high thermal conductivity. Our products are cost-effective and have a good price advantage. We cater to many European and American markets and look forward to becoming your long-term partner in China.
CVD SiC Pancake Susceptor
Unleash the pinnacle of precision in semiconductor manufacturing with our cutting-edge CVD SiC Pancake Susceptor. This disc-shaped component, expertly designed for semiconductor equipment, serves as a crucial element for supporting thin semiconductor wafers during high-temperature epitaxial deposition processes. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
TaC Coated Guide Ring
Semicorex TaC Coated Guide Ring, a pinnacle of innovation in SiC (Silicon Carbide) single crystal growth furnaces. Meticulously designed to meet the exacting demands of the semiconductor industry, this guide ring promises to redefine your crystal growth processes with unparalleled precision and reliability.

Related Blog
Reviews

What is Low Temperature Plasma Etching?
Plasma is the fourth state of matter, and it plays a crucial role in both industrial applications and natural phenomena.
Silicon Carbide Ceramic Membrane: a new separation membrane that is expected to replace various inorganic membranes
Silicon carbide ceramic membranes have the characteristics of high chemical stability, good thermal shock resistance, strong hydrophilicity, large membrane flux, high mechanical strength, concentrated pore size distribution, and good pore structure gradient.
What Challenges Are Involved in SiC Manufacturing?
In the landscape of wide bandgap semiconductor materials, silicon carbide (SiC) has emerged as a highly regarded material, particularly excelling in the high-power conversion domain.
The structure of Electrostatic Chuck(ESC)
An Electrostatic Chuck (ESC) is a device used to hold semiconductor wafers in place during processes such as etching, deposition, or polishing.
Annealing Processes in Modern Semiconductor Manufacturing
As technology nodes continue to shrink, the formation of ultra-shallow junctions presents significant challenges. Thermal annealing processes including Rapid thermal annealing (RTA) and flash lamp annealing (FLA) are vital techniques that maintain high impurity activation rates while minimizing diffusion, ensuring optimal device performance.
China remained the largest semiconductor equipment market
Worldwide sales of semiconductor manufacturing equipment increased 5 percent from $102.6 billion in 2021 to an all-time record of $107.6 billion last year, SEMI, the industry association representing the global electronics design and manufacturing supply chain.

China Reactive Ion Etching Ring Manufacturers, Suppliers, Factory

Related Products

Hot Products

Graphite Top Plates

Bulk SiC Ring

Wafer Loader Arm

PSS Etching Carrier Tray for Wafer Processing

CVD SiC Pancake Susceptor

TaC Coated Guide Ring

What is Low Temperature Plasma Etching?

Silicon Carbide Ceramic Membrane: a new separation membrane that is expected to replace various inorganic membranes

What Challenges Are Involved in SiC Manufacturing?

The structure of Electrostatic Chuck(ESC)

Annealing Processes in Modern Semiconductor Manufacturing

China remained the largest semiconductor equipment market

Jocelyn 2024-03-26 05:02:09

Lena 2024-02-16 08:44:25

Clara 2024-03-17 01:15:58

Jill 2024-03-27 17:52:00

Annabelle 2023-10-18 18:16:33

Edwina 2023-03-22 16:02:34

Send Inquiry