Semiconductor Quartz Crucibles

Semicorex Semiconductor Quartz Crucibles are consumable products in the semiconductor industry specifically for the quartz crucibles used in the crystal pulling process of silicon single crystal manufacture. They are manufactured from ultra-pure fused quartz that satisfy cleanliness, homogeneity, and heat resistance and are manufactured to meet the high demands of modern semiconductor manufacturing. They are vital to the silicon ingot specification because their attributes directly impact wafer performance and yield in integrated circuit processing.

From a thermal and physical point of view: quartz crucibles can withstand heat very well. The deformation point is approximately 1100 °C, the softening point is approximately 1730 °C, and the maximum continuous service temperature is 1100 °C, [short term exposure up to 1450 °C]. These properties allow usability at high temperatures while providing high purity and thermal resilience, and therefore, promote stability during the Czochralski (CZ) crystal pulling processes, where contamination and deformation need to be minimized, and accurate thermal profiles are paramount to obtaining homogeneous crystal growth.

From a structural perspective, semiconductor quartz crucibles consist of a layered composite structure designed for thermal properties and mechanical strength. The starting (moving inwards) layer is a transparent quartz layer which is, in general, one-third of the wall thickness (about 3–5 mm), and has a relatively low bubble content (depending on processing technique) and therefore a smooth defect-free surface will be in contact with the molten silicon quartz surface (this contributes to controlling contamination and ensuring stable conditions for crystal growth).

The outside is layered with a greater level of bubbles contributing to the crucible's deformation strength, higher thermal stress resistance, and thermal insulation from the heat source for radiation uniformity. The layers of the crucible allow it to maintain form and integrity, despite degree differential thermal gradients which exist in the crystal pulling process.

Modern quartz crucibles have developed further than the traditional two-layer structure due to advances in manufacturing technology. Many crucibles employ a three-layer structure-a transparent inner layer, transparent middle layer that has bubbles dispersed through the quartz, and an outer thin layer of bubbly quartz. Three-layer structures offer better mechanical strength, thermal management, and cost benefits, and improve heat transfer characteristics. Also, some crucibles apply coatings of alkali metal ions (e.g., barium ion solutions) on the innermost surface, or use high-purity synthetic quartz in specific layers, to help reduce oxygen content, deplete purities, and improve the overall quality of the pulled single crystals.

Manufacturing quartz crucibles for semiconductors is intended to be held to strict quality control tolerances at the purities needed, which is usually several parts per billion of metallic impurities. The raw materials are carefully selected and purified to remove any contaminants. They are formed to rough dimensions, with proper thermal treatment applied, and surface finished to address dimensional accuracy, mechanical strength, and cleanliness. The process is geared toward assuring that the crucibles will remain reliable while being subjected to prolonged high-temperature exposure in harsh chemical environments.

The performance of the quartz crucible in semiconductor production influences the uniformity of the silicon crystal lattice, the defect density, and the oxygen in the ingot. High purities and defect-free quartz crucibles, will limit the dislocation of crystal defects, enhance the yield rate, and establish the capability of generating wafers to advance device geometries. If you are a producer of hgh-performance ICs, photovoltaic-grade silicon, or power electronics, selecting and using quartz crucibles of high quality is a crucial element for establishing and optimizing cost-performance.

Semicorex Semiconductor Quartz Crucibles are an essential auxiliary material for any silicon crystal pulling system. The unique attributes of purity, high temperature stability, and proprietary multi-layer structures make this a suitable material for supporting the rigors of the CZ pulling process while providing consistent and reproducible performance. As semiconductor manufacturing moves toward higher integration and tighter tolerances, the significant value-added benefits of precision engineered quartz crucibles will generate more importance towards enabling and developing next generation electronic technologies.