Ceramic Focus Rings for Semiconductor

Semicorex ceramic focus rings for semiconductor are the ideal solutions tailored for the harsh plasma etching operating conditions. During the sophisticated semiconductor etching process, it is crucial to precisely control plasma distribution, which can ensure etching chamber stability and consistent semiconductor etching uniformity. As the indispensable components used in the advanced etching equipment, focus rings are typically positioned around the semiconductor wafers and come into direct contact with them. The performance of focus rings exerts direct impacts on the process repeatability, product yield, and equipment uptime.

Advantages of Semicorex ceramic focus rings for semiconductor

1.Ultra-high material purity

The purity of our CVD SiC material exceeds 99.9995%. This can effectively prevent the contamination of the etching chamber and semiconductor wafers caused by insufficient material purity.

2.Exceptional corrosion resistance

Semicorex ceramic focus rings for semiconductor are made from CVD SiC, featuring excellent resistance to oxidation, erosion, and chemical corrosion, being especially effective against process gases such as HF and HCI, as well as plasma gas.

3.Superior resistance performance

Resistance uniformity of Semicorex ceramic focus rings for semiconductor is less than 5%.

Resistivity ranges: Low Res. (<0.02 Ω·cm), Middle Res. (0.2–25 Ω·cm), High Res. (>100 Ω·cm).

Functions of Semicorex ceramic focus rings for semiconductor

1.Control and uniformize the edge electric field and plasma distribution

Semicorex ceramic focus rings for semiconductor can control the distribution of the electric field inside the etching chamber and achieve a more uniform plasma sheath around semiconductor wafers, enabling plasma to impinge on the wafer surface in a vertical and uniform way. In this way, the etching edge effect can be greatly reduced and the etching precision can be significantly improved.

2.Protect the electrostatic chuck

Without the protection of focus rings in the etching process, the electrostatic chuck will be exposed to the bombardment and erosion of high-energy plasma. Electrostatic chucks are made of high-cost materials with extremely high replacement expense. Using focus rings can effectively lower plasma corrosion on the electrostatic chuck and minimize maintenance and replacement costs of the electrostatic chuck.