Wafer Holder, Wafer Carrier

Semicorex CVD Epitaxial Deposition In Barrel Reactor is a highly durable and reliable product for growing epixial layers on wafer chips. Its high-temperature oxidation resistance and high purity make it suitable for use in the semiconductor industry. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for high-quality epixial layer growth.

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Product Description

Using a complete scientific high quality management program, superior high quality and superior faith, we acquire great reputation and occupied this industry for Wafer Holder, Wafer Carrier, 1st business enterprise, we find out each other. Even further business enterprise, the trust is getting there. Our enterprise always at your services at any time. Wafer Holder, Wafer Carrier Quartz Boat, 6inch, Transparent, Our expert engineering team will generally be prepared to serve you for consultation and feedback. We're able to also give you with free of charge samples to meet your requirements. Best efforts will likely be produced to provide you the best service and merchandise. When you are keen on our business and items, make sure you speak to us by sending us emails or call us quickly. In an effort to know our merchandise and company extra, you may come to our factory to view it. We'll generally welcome guests from all over the world to our business to create business relations with us. Be sure to feel cost-free to speak to us for small business and we believe we are going to share the best trading experience with all our merchants.

Our Wafer Holder, Wafer Carrier is a high-performance product designed to deliver reliable performance in extreme environments. Its superior coating adhesion, high-temperature oxidation resistance, and corrosion resistance make it an excellent choice for use in harsh environments. Additionally, its even thermal profile, laminar gas flow pattern, and prevention of contamination ensure the high quality of the epixial layer.

At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our Wafer Holder, Wafer Carrier has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.

Parameters of Wafer Holder, Wafer Carrier

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of Wafer Holder, Wafer Carrier

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.

Hot Tags: Quartz Boat, 6inch, Transparent

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