Silicon Carbide Chamber Lid used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex is a large-scale manufacturer and supplier of Silicon Carbide Coated Graphite Susceptor in China. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner.
Sic Honeycomb Ceramic Wall-Flow Sic DPF used in single crystal growth or MOCVD, or wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex supplies high-purity silicon carbide (SiC) coated graphite construction provides superior heat resistance, even thermal uniformity for consistent epi layer thickness and resistance, and durable chemical resistance. They are durable to experience a combination of volatile precursor gases, plasma, and high temperature.
Our Sic Honeycomb Ceramic Wall-Flow Sic DPF is designed to achieve the best laminar gas flow pattern, ensuring evenness of thermal profile. This helps to prevent any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.
Contact us today to learn more about our Sic Honeycomb Ceramic Wall-Flow Sic DPF.
Parameters of Sic Honeycomb Ceramic Wall-Flow Sic DPF
Main Specifications of CVD-SIC Coating |
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SiC-CVD Properties |
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Crystal Structure |
FCC β phase |
|
Density |
g/cm ³ |
3.21 |
Hardness |
Vickers hardness |
2500 |
Grain Size |
μm |
2~10 |
Chemical Purity |
% |
99.99995 |
Heat Capacity |
J·kg-1 ·K-1 |
640 |
Sublimation Temperature |
℃ |
2700 |
Felexural Strength |
MPa (RT 4-point) |
415 |
Young’ s Modulus |
Gpa (4pt bend, 1300℃) |
430 |
Thermal Expansion (C.T.E) |
10-6K-1 |
4.5 |
Thermal conductivity |
(W/mK) |
300 |
Features of Sic Honeycomb Ceramic Wall-Flow Sic DPF
● Ultra-flat capabilities
● Mirror polish
● Exceptional light weight
● High stiffness
● Low thermal expansion
● Extreme wear resistance