Pancake susceptor reactor for MOCVD epitaxial growth

Semicorex RTP Carrier for MOCVD Epitaxial Growth is ideal for semiconductor wafer processing applications, including epitaxial growth and wafer handling processing. Carbon graphite susceptors and quartz crucibles are processed by MOCVD on the surface of graphite, ceramics, etc. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Dependable high-quality and fantastic credit standing are our principles, which will help us at a top-ranking position. Adhering to your tenet of "quality very first, client supreme" for Pancake susceptor reactor for MOCVD epitaxial growth, We welcome new and previous consumers from all walks of lifestyle to speak to us for upcoming business enterprise associations and mutual results! Pancake susceptor reactor for MOCVD epitaxial growth Sapphire Substrates Wafer, Epiready Wafer, Semiconductor Wafer, Pancake susceptor, pancake reactor, MOCVD epitaxial growth, Our company abides by the management idea of "keep innovation, pursue excellence". On the basis of assuring the advantages of existing solutions, we continuously strengthen and extend product development. Our company insists on innovation to promote the sustainable development of enterprise, and make us become the domestic high-quality suppliers.

Semicorex supplies Pancake susceptor reactor for MOCVD epitaxial growth used to support wafers, which is really stable for RTA, RTP or harsh chemical cleaning. At the core of the process, the epitaxy susceptors, are first subjected to the deposition environment, so it has high heat and corrosion resistance. The SiC coated carrier also has a high thermal conductivity, and excellent heat distribution properties.
Our Pancake susceptor reactor for MOCVD epitaxial growth is designed to achieve the best laminar gas flow pattern, ensuring evenness of thermal profile. This helps to prevent any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.
Contact us today to learn more about our Pancake susceptor reactor for MOCVD epitaxial growth.

Parameters of Pancake susceptor reactor for MOCVD epitaxial growth

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of Pancake susceptor reactor for MOCVD epitaxial growth

High purity SiC coated graphite
Superior heat resistance & thermal uniformity
Fine SiC crystal coated for a smooth surface
High durability against chemical cleaning
Material is designed so that cracks and delamination do not occur.

Hot Tags: Sapphire Substrates Wafer, Epiready Wafer, Semiconductor Wafer, Pancake susceptor, pancake reactor, MOCVD epitaxial growth

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