Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth

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Product Description

We emphasize advancement and introduce new products into the market each year for Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth, Good quality, timely service and Competitive price, all win us a good fame in xxx field despite the international intense competition. Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth Mbe Crucible, Pbn, Pyrolytic Boron Nitride, With the first-class products, excellent service, fast delivery and the best price, we have won highly praise foreign customers'. Our products have been exported to Africa, the Middle East, Southeast Asia and other regions.

Our Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth are made by CVD chemical vapor deposition under high-temperature chlorination conditions, ensuring high purity. The product's surface is dense, with fine particles and high hardness, making it corrosion-resistant to acid, alkali, salt, and organic reagents.
Our product is designed to achieve the best laminar gas flow pattern, guaranteeing the evenness of thermal profile. Our Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth prevent any contamination or impurity diffusion during the epitaxial growth process, ensuring high-quality results.
At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth have a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.

Parameters of Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Parameters of Molecular Beam Epitaxy (MBE) Crucible for Crystal Epitaxial Growth

- Avoid peeling off and ensure coating on all surface
High temperature oxidation resistance: Stable at high temperatures up to 1600°C
High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.
Corrosion resistance: high hardness, dense surface and fine particles.
Corrosion resistance: acid, alkali, salt and organic reagents.
- Achieve the best laminar gas flow pattern
- Guarantee evenness of thermal profile
- Prevent any contamination or impurities diffusion

Hot Tags: Mbe Crucible, Pbn, Pyrolytic Boron Nitride

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