Made in China Isostatic Technology Coated Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible

Introducing the CVD Tac coated crucible, the perfect solution for semiconductor equipment manufacturers and users who demand the highest level of quality and performance. Our crucibles are coated with a state-of-the-art CVD Tac (tantalum carbide) layer, which provides superior resistance to corrosion and wear, making them ideal for use in a variety of semiconductor applications.

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Product Description

We also offer you product sourcing and flight consolidation expert services. We've our personal manufacturing unit and sourcing business. We can offer you virtually every variety of merchandise associated to our item range for Made in China Isostatic Technology Coated Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible, Never-ending improvement and striving for 0% deficiency are our two main quality policies. Should you need anything, don't hesitate to contact us. Made in China Isostatic Technology Coated Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible, China Crucible, China Graphite Crucible, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We have been always here working for your demands whenever you want.

Crafted from high-quality materials and coated with the most advanced CVD Tac technology, our crucibles offer exceptional performance and longevity. The CVD Tac coating provides a highly uniform, dense layer that is highly resistant to chemical attack, abrasion, and thermal shock. This ensures that our crucibles maintain their shape and dimensions even after repeated use, reducing the need for frequent replacements.

Our CVD Made in China Isostatic Technology Coated Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucibles are also highly compatible with a wide range of semiconductor processes, including chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD). Whether you are producing microchips, solar cells, or other semiconductor devices, our crucibles can help you achieve optimal results.

Parameters of TaC Coating

Projects	Parameters
Density	14.3 (gm/cm³)
Emissivity	0.3
CTE (×10^-6/K)	6.3
Hardness (HK)	2000
Resistance (Ohm-cm)	1×10^-5
Thermal Stability	<2500℃
Graphite Dimension Change	-10~-20um (reference value)
Coating Thickness	≥20um typical value(35um±10um)

The above are typical values

Features and benefits of our CVD Made in China Isostatic Technology Coated Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucibles include:

High-purity materials for reduced contamination and increased yield

Excellent thermal conductivity for uniform heating and cooling

Exceptional resistance to thermal shock for increased durability

Wide range of sizes and shapes available to meet your specific needs

Customization options available upon request

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