LPE Barrel Susceptor SiC Coatings

Semicorex CVD Epitaxial Deposition In Barrel Reactor is a highly durable and reliable product for growing epixial layers on wafer chips. Its high-temperature oxidation resistance and high purity make it suitable for use in the semiconductor industry. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for high-quality epixial layer growth.

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Product Description

"Sincerity, Innovation, Rigorousness, and Efficiency" could be the persistent conception of our organization for your long-term to establish alongside one another with shoppers for mutual reciprocity and mutual benefit for LPE Barrel Susceptor SiC Coatings, As a key business of this industry, our company makes endeavours to become a leading supplier, based on the faith of specialist quality & throughout the world company. LPE Barrel Susceptor SiC Coatings, With more than 9 years of experience and a skilled team, now we have exported our items to many countries and regions all over the world. We welcome customers, business associations and friends from all parts of the world to contact us and seek cooperation for mutual benefits.

Our LPE Barrel Susceptor SiC Coatings is a high-performance product designed to deliver reliable performance in extreme environments. Its superior coating adhesion, high-temperature oxidation resistance, and corrosion resistance make it an excellent choice for use in harsh environments. Additionally, its even thermal profile, laminar gas flow pattern, and prevention of contamination ensure the high quality of the epixial layer.

At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our LPE Barrel Susceptor SiC Coatings has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.

Parameters of LPE Barrel Susceptor SiC Coatings

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of LPE Barrel Susceptor SiC Coatings

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.

Hot Tags: LPE, Barrel Susceptor, Epi wafer, SiC coating

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