Isostatic Pressing Technology Coated Graphite Crucible Silicon Carbide Crucible

Introducing the CVD Tac coated crucible, the perfect solution for semiconductor equipment manufacturers and users who demand the highest level of quality and performance. Our crucibles are coated with a state-of-the-art CVD Tac (tantalum carbide) layer, which provides superior resistance to corrosion and wear, making them ideal for use in a variety of semiconductor applications.

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Product Description

It really is a good way to further improve our goods and service. Our mission would be to acquire inventive items to buyers with a very good encounter for Isostatic Pressing Technology Coated Graphite Crucible Silicon Carbide Crucible, We are keeping durable business relationships with more than 200 wholesalers in the USA, the UK, Germany and Canada. If you are interested in any of our products, please feel free to contact us. Isostatic Pressing Technology Coated Graphite Crucible, Graphite Crucible, Silicon Carbide Crucible, Our next goal is to exceed the expectations of every client by offering outstanding customer service, increased flexibility and greater value. All in all, without our customers we do not exist; without happy and fully satisfied customers, we fail. We're looking for the wholesale, Drop ship. Make sure you contact us if you are interesting our solutions. Hope to do business with you all. High quality and fast shipment!

Crafted from high-quality materials and coated with the most advanced CVD Tac technology, our crucibles offer exceptional performance and longevity. The CVD Tac coating provides a highly uniform, dense layer that is highly resistant to chemical attack, abrasion, and thermal shock. This ensures that our crucibles maintain their shape and dimensions even after repeated use, reducing the need for frequent replacements.

Our CVD Isostatic Pressing Technology Coated Graphite Crucible Silicon Carbide Crucibles are also highly compatible with a wide range of semiconductor processes, including chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD). Whether you are producing microchips, solar cells, or other semiconductor devices, our crucibles can help you achieve optimal results.

Parameters of TaC Coating

Projects	Parameters
Density	14.3 (gm/cm³)
Emissivity	0.3
CTE (×10^-6/K)	6.3
Hardness (HK)	2000
Resistance (Ohm-cm)	1×10^-5
Thermal Stability	<2500℃
Graphite Dimension Change	-10~-20um (reference value)
Coating Thickness	≥20um typical value(35um±10um)

The above are typical values

Features and benefits of our CVD Isostatic Pressing Technology Coated Graphite Crucible Silicon Carbide Crucibles include:

High-purity materials for reduced contamination and increased yield

Excellent thermal conductivity for uniform heating and cooling

Exceptional resistance to thermal shock for increased durability

Wide range of sizes and shapes available to meet your specific needs

Customization options available upon request

Hot Tags: Crucible, Graphite Crucible, Silicon Carbide Crucible

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