Semicorex advanced, high-purity Silicon Carbide Coated Components are built to withstand the extreme environments in wafer handling process. Our Semiconductor Wafer Chuck has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
Semicorex ultra-flat Hot Purity Graphite Chuck is high purity SiC coated using in the wafer handling process. Hot Purity Graphite Chuck by MOCVD equipment Compound growth has high heat and corrosion resistance, which has great stability in extreme environment, and improve yield management for semiconductor wafer processing. Low-surface-contact configurations minimize the risk of back-side particles for sensitive applications.
Parameters of Hot Purity Graphite Chuck
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Main Specifications of CVD-SIC Coating |
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SiC-CVD Properties |
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Crystal Structure |
FCC β phase |
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Density |
g/cm ³ |
3.21 |
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Hardness |
Vickers hardness |
2500 |
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Grain Size |
μm |
2~10 |
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Chemical Purity |
% |
99.99995 |
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Heat Capacity |
J·kg-1 ·K-1 |
640 |
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Sublimation Temperature |
℃ |
2700 |
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Felexural Strength |
MPa (RT 4-point) |
415 |
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Young’ s Modulus |
Gpa (4pt bend, 1300℃) |
430 |
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Thermal Expansion (C.T.E) |
10-6K-1 |
4.5 |
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Thermal conductivity |
(W/mK) |
300 |
Features of Hot Purity Graphite Chuck
- CVD Silicon Carbide coatings to improve service life.
- Ultra-flat capabilities
- High stiffness
- Low thermal expansion
- Extreme wear resistance

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