High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater
  • Air ProHigh Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater
  • Air ProHigh Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater
  • Air ProHigh Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater
  • Air ProHigh Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater
  • Air ProHigh Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater

High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater

Semicorex is a large-scale manufacturer and supplier of Silicon Carbide Coated Graphite Susceptor in China. We focus on semiconductor industries such as silicon carbide layers and epitaxy semiconductor. Our Wafer Process Heater has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner.

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Product Description

We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater, Welcome around the world customers to make contact with us for enterprise and long-term cooperation. We're going to be your trustworthy partner and supplier of auto pieces and accessories in China. High Temperature Sic Heating Element, Sic Heater, Furnace Heater, With the aim of "compete with good quality and develop with creativity" and the service principle of "take customers' demand as orientation", we are going to earnestly supply qualified solutions and good service for domestic and international customers.

Semicorex High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater is made by Silicon Carbide Coating (SiC) graphite, the coating is applied by a CVD method to specific grades of high density graphite, so it can operate in the high temperature furnace with over 3000 °C in an inert atmosphere, 2200°C in vacuum.
The special properties and low mass of the High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater material allow fast heating rates, uniform temperature distribution and outstanding precision in control. In comparison to other material the surface of Silicon Carbide stays flat due to its low thermal expansion even when operated with fast changes in temperature. The hot plates are very suitable for demanding processes in semiconductor processing systems.
At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.


Parameters of High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater

Technical Specification

VET-M3

Bulk Density (g/cm3)

≥1.85

Ash Content (PPM)

≤500

Shore Hardness

≥45

Specific Resistance (μ.Ω.m)

≤12

Flexural Strength (Mpa)

≥40

Compressive Strength (Mpa)

≥70

Max. Grain Size (μm)

≤43

Coefficient of Thermal Expansion Mm/°C

≤4.4*10-6


Features of High Temperature Sic Heating Element, Sic Furnace Heater, SiC Wafer Process Heater

- CVD SiC coatings to improve service life.
- High temperature resistance, corrosion resistance, long service life, can improve wafer quality and yield.
- It has extremely low coefficient of thermal expansion, high temperature resistance, high wear resistance, good insulation, good chemical stability, and near-purple (red) visible light penetration.

We can provide anti-oxidation and long life span graphite crucible, graphite mold and all parts of graphite heater.





Hot Tags: Sic Heating Element, Sic Heater, Furnace Heater

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