Semicorex PSS Etching Carrier Plate for Semiconductor is specially engineered for high-temperature and harsh chemical cleaning environments required for epitaxial growth and wafer handling processes. Our ultra-pure PSS Etching Carrier Plate for Semiconductor is designed to support wafers during thin-film deposition phases like MOCVD and epitaxy susceptors, pancake or satellite platforms. Our SiC coated carrier has high heat and corrosion resistance, excellent heat distribution properties, and a high thermal conductivity. We provide cost-effective solutions to our customers, and our products cover many European and American markets. Semicorex looks forward to being your long-term partner in China.
The GaN LED Epitaxial Wafer Susceptors Manufacturer Pss Sapphire Substrate from Semicorex is the ideal solution for thin-film deposition phases like MOCVD, epitaxy susceptors, pancake or satellite platforms, and wafer handling processing such as etching. Our ultra-pure graphite carrier is designed to support wafers and withstand harsh chemical cleaning and high-temperature environments. The SiC coated carrier has high heat and corrosion resistance, excellent heat distribution properties, and a high thermal conductivity. Our products are cost-effective and have a good price advantage.
Contact us today to learn more about our GaN LED Epitaxial Wafer Susceptors Manufacturer Pss Sapphire Substrate.
Parameters of GaN LED Epitaxial Wafer Susceptors Manufacturer Pss Sapphire Substrate
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Main Specifications of CVD-SIC Coating |
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SiC-CVD Properties |
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Crystal Structure |
FCC β phase |
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Density |
g/cm ³ |
3.21 |
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Hardness |
Vickers hardness |
2500 |
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Grain Size |
μm |
2~10 |
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Chemical Purity |
% |
99.99995 |
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Heat Capacity |
J·kg-1 ·K-1 |
640 |
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Sublimation Temperature |
℃ |
2700 |
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Felexural Strength |
MPa (RT 4-point) |
415 |
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Young’ s Modulus |
Gpa (4pt bend, 1300℃) |
430 |
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Thermal Expansion (C.T.E) |
10-6K-1 |
4.5 |
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Thermal conductivity |
(W/mK) |
300 |
Features of GaN LED Epitaxial Wafer Susceptors Manufacturer Pss Sapphire Substrate
- Avoid peeling off and ensure coating on all surface
High temperature oxidation resistance: Stable at high temperatures up to 1600°C
High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.
Corrosion resistance: high hardness, dense surface and fine particles.
Corrosion resistance: acid, alkali, salt and organic reagents.
- Achieve the best laminar gas flow pattern
- Guarantee evenness of thermal profile
- Prevent any contamination or impurities diffusion






