GaN Epitaxial Wafer Supplier Provide GaN on Silicon Wafer Pancake susceptor

Semicorex's Etching Carrier Holder for PSS Etching is engineered for the most demanding epitaxy equipment applications. Our ultra-pure graphite carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The SiC coated carrier has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.

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Product Description

We have been proud from the higher consumer gratification and wide acceptance due to our persistent pursuit of high quality both on product or service and service for GaN Epitaxial Wafer Supplier Provide GaN on Silicon Wafer Pancake susceptor, With the eternal goal of "continuous quality improvement, customer satisfaction", we are sure that our product quality is stable and reliable and our products are best-selling at home and abroad. GaN Epitaxial Wafer Supplier Provide GaN on Silicon Wafer Pancake susceptor GaN Epi Wafer Manufacturer, GaN Wafer Manufacturer, GaN Substrate Supplier, With a wide range, good quality, reasonable prices and stylish designs, our goods are extensively used in beauty and other industries. Our items are widely recognized and trusted by users and can meet continuously changing economic and social needs.

At Semicorex, we have designed the GaN Epitaxial Wafer Supplier Provide GaN on Silicon Wafer Pancake susceptor specifically for the harsh environments required for epitaxial growth and wafer handling processes. Our ultra-pure graphite carrier is ideal for thin-film deposition phases like MOCVD, epitaxy susceptors, pancake or satellite platforms, and wafer handling processing such as etching. The SiC coated carrier has high heat and corrosion resistance, excellent heat distribution properties, and a high thermal conductivity. Our products are cost-effective and offer a good price advantage.

Parameters of GaN Epitaxial Wafer Supplier Provide GaN on Silicon Wafer Pancake susceptor

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of GaN Epitaxial Wafer Supplier Provide GaN on Silicon Wafer Pancake susceptor

- Avoid peeling off and ensure coating on all surface

High temperature oxidation resistance: Stable at high temperatures up to 1600°C

High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.

Corrosion resistance: high hardness, dense surface and fine particles.

Corrosion resistance: acid, alkali, salt and organic reagents.

- Achieve the best laminar gas flow pattern

- Guarantee evenness of thermal profile

- Prevent any contamination or impurities diffusion

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