Factory Direct Isostatic Pressing Technology Coating Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible

Factory Direct Isostatic Pressing Technology Coating Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible

Semicorex Barrel Susceptor Epi System is a high-quality product that offers superior coating adhesion, high purity, and high-temperature oxidation resistance. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for the growth of epixial layers on wafer chips. Its cost-effectiveness and customizability make it a highly competitive product in the market.

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Product Description

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Our Factory Direct Isostatic Pressing Technology Coating Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible is a highly innovative product that offers excellent thermal performance, even thermal profile, and superior coating adhesion. Its high purity, high-temperature oxidation resistance, and corrosion resistance make it a highly reliable product for use in the semiconductor industry. Its prevention of contamination and impurities and low maintenance requirements make it a highly competitive product in the market.
At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our Factory Direct Isostatic Pressing Technology Coating Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.
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Parameters of Factory Direct Isostatic Pressing Technology Coating Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Factory Direct Isostatic Pressing Technology Coating Graphite Crucible Graphite Silicon Carbide Crucible Clay Crucible

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.




Hot Tags: Crucible, Graphite Crucible, Silicon Carbide Crucible

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