Dz400/2L Chamber Sealer & Vacuum Chamber

MOCVD Vacuum Chamber Lid used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex Silicon Carbide Coated MOCVD Vacuum Chamber Lid engineered specifically stand up to these challenging environments. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

We've been also focusing on improving upon the stuff management and QC program to make sure that we could hold fantastic gain in the fiercely-competitive enterprise for Dz400/2L Chamber Sealer & Vacuum Chamber, Honesty is our principle, professional operation is our work, service is our goal, and customers' satisfaction is our future! Dz400/2L Chamber Sealer & Vacuum Chamber, Chamber Sealer, Vacuum Machines for Packaging, We've got been perfectly devoted to the design, R&D, manufacture, sale and service of hair products during 10 years of development. We now have introduced and are making full use of internationally advanced technology and equipment, with advantages of skilled workers. "Dedicated to providing reliable customer service" is our aim. We've been sincerely looking forward to establishing business relationships with friends from at home and abroad.

Semicorex Graphite components are high purity SiC coated graphite, using in the process to grow the single crystal and wafer process. The Dz400/2L Chamber Sealer & Vacuum Chamber Compound growth has high heat and corrosion resistance, are durable to experience a combination of volatile precursor gases, plasma, and high temperature.

At Semicorex, we are committed to providing high-quality products and services to our customers. We use only the best materials, and our products are designed to meet the highest standards of quality and performance. Our Dz400/2L Chamber Sealer & Vacuum Chamber is no exception. Contact us today to learn more about how we can help you with your semiconductor wafer processing needs.

Parameters of Dz400/2L Chamber Sealer & Vacuum Chamber

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300