Ain Ceramic End Effector for Semiconductor Processing

Ain Ceramic End Effector for Semiconductor Processing

Semicorex is your partner for advanced graphite components and assemblies to support higher throughput and better yields in your semiconductor processing equipment. Our materials experts are ready to work with you to develop the optimal right solution for your wafer handling, heating, and processing requirements. Our Ceramic End Effector has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Our firm has been concentrating on brand strategy. Customers' pleasure is our best advertising. We also supply OEM company for Ain Ceramic End Effector for Semiconductor Processing, Our company is working through the procedure principle of "integrity-based, cooperation created, people oriented, win-win cooperation". We hope we can have a pleasant relationship with businessman from all around the earth. Ain Ceramic End Effector for Semiconductor Processing Aluminum Nitride Ceramic, Ain Ceramic Supplier, Ain Ceramic Manufacturing, With the goal of "zero defect". To care for the environment, and social returns, care employee social responsibility as own duty. We welcome friends from all over the world to visit and guide us so that we can achieve the win-win goal together.

Ain Ceramic End Effector for Semiconductor Processing is the robot's hand which move semiconductor wafers between positions in wafer processing equipment and carriers. End effector must be dimensionally precise and thermally stable, while having a smooth, abrasion-resistant surface to safely handle wafers without damaging devices or producing particulate contamination. Our high-purity silicon carbide Ain Ceramic End Effector for Semiconductor Processing provide superior heat resistance, even thermal uniformity for consistent epi layer thickness and resistance, and durable chemical resistance.

At Semicorex, we focus on providing high-quality, cost-effective Ain Ceramic End Effector for Semiconductor Processing, we prioritize customer satisfaction and provide cost-effective solutions. We look forward to becoming your long-term partner, delivering high-quality products and exceptional customer service.


Parameters of Ain Ceramic End Effector for Semiconductor Processing

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of high purity Ain Ceramic End Effector for Semiconductor Processing

● High purity SiC coated graphite

● Superior heat resistance & thermal uniformity

● Fine SiC crystal coated for a smooth surface

● High durability against chemical cleaning

● Material is designed so that cracks and delamination do not occur.




Hot Tags: Aluminum Nitride Ceramic, Ain Ceramic Supplier, Ain Ceramic Manufacturing

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