220994 Plasma Consumables Plasma Swirl Ring for 65/85/105

Semicorex Plasma processing focus ring is specially designed to meet the high demands of plasma etch processing in the semiconductor industry. Our advanced, high-purity Silicon Carbide Coated Components are built to withstand extreme environments and are suitable for use in various applications, including silicon carbide layers and epitaxy semiconductors.

Send Inquiry

Product Description

We hold strengthening and perfecting our items and repair. At the same time, we get the job done actively to do research and progress for 220994 Plasma Consumables Plasma Swirl Ring for 65/85/105, We are going to do our greatest to satisfy or exceed customers' prerequisites with excellent goods, advanced concept, and economical and timely company. We welcome all clients. 220994 Plasma Consumables, Swirl Ring, Plasma Swirl Ring, Upon today, we have customers from all over the world, including USA, Russia, Spain, Italy, Singapore, Malaysia, Thailand, Poland, Iran and Iraq. The mission of our company is to provide the highest quality products with best price. We are looking forward to doing business with you.

Our 220994 Plasma Consumables Plasma Swirl Ring for 65/85/105 is highly stable for RTA, RTP, or harsh chemical cleaning, making them an ideal choice for use in plasma etch (or dry etch) chambers. Designed to improve etch uniformity around the wafer edge or perimeter, our focus rings or edge rings are engineered to minimize contamination and unscheduled maintenance.

Our SiC Coating is a dense, wear-resistant silicon carbide coating with high corrosion and heat resistance properties as well as excellent thermal conductivity. We apply SiC in thin layers onto the graphite using the chemical vapor deposition (CVD) process. This ensures that our SiC Focus Rings have superior quality and durability, making them a reliable choice for your plasma etch processing needs.

Parameters of 220994 Plasma Consumables Plasma Swirl Ring for 65/85/105

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of 220994 Plasma Consumables Plasma Swirl Ring for 65/85/105

- CVD Silicon Carbide coatings to improve service life.

- Thermal insulation made of high-performance purified rigid carbon.

- Carbon/Carbon composite heater and plate. - Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High-purity graphite and SiC coating for pinhole resistance and higher lifetime

Hot Tags: Plasma Consumables, Swirl Ring, Plasma Swirl Ring

Send Inquiry

Please Feel free to give your inquiry in the form below. We will reply you in 24 hours.