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CVD SiC Focus Ring For 2L10-506419-21

CVD SiC Focus Ring For 2L10-506419-21

Made from high-performance CVD SiC materials, Semicorex CVD SiC focus ring for 2L10-506419-21 is the crucial ring part sengineered specially for TEL VIGUS RK4 equipment used in the precision semiconductor etching processes. Choosing Semicorex means you will obtain the ideal CVD SiC solutions to achieve precise and uniform etching results.

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Product Description

During the plasma etching process, the non-uniform plasma distribution in the reaction chamber can lead to severe defects at the wafer edge, which will lower the semiconductor device yield. Semicorex CVD SiC focus ring for 2L10-506419-21 is the ideal component to address this pain point. It is typically installed on the electrostatic chuck and placed around the wafer edge. Semicorex CVD SiC focus ring for 2L10-506419-21 is able to focus plasma on the wafer surface and optimize the electric field distribution within the reaction chamber. In this way, it can effectively prevent the phenomenon of wafer edge over-etching, thereby ensuring precise and uniform etching results.

CVD SiC focus ring for 2L10-506419-21


Functions of Semicorex CVD SiC focus ring for 2L10-506419-21


1.It can improve the etching uniformity and maintain a consistent etch rate between the wafer center and edge, thus boosting the final semiconductor chips’ yield.


2.It can help create a stable etching condition to minimize process deviation and particle contamination caused by uneven plasma distribution.


3.It can shield the wafer edge to prevent plasma-induced over-etching and edge damage.


Excellent material properties

Semicorex CVD SiC focus ring for 2L10-506419-21 is precisely manufactured from solid CVD SiC materials. The CVD process can significantly enhance the structural and functional performance of silicon carbide, making Semicorex CVD SiC focus ring for 2L10-506419-21 feature the following excellent properties to fulfill complex etching operating environments.

1.Ultra-high purity, and its impurity content is less than 5 ppm.


2.High mechanical strength thanks to their dense internal structure.


3.Superior thermal management capability, no melting or softening occurrs in the material at a temperature of around 2000°C.


4.Exceptional corrosion resistance, it can withstand the plasma etching and erosion by process gases including HF, HCl, and NH₃.


High-precision quality control

Semicorex always puts component precision and quality as its top priority and produces CVD SiC focus rings strictly according to professional precision standards of the semiconductor industry, which thus ensures Semicorex CVD SiC focus ring for 2L10-506419-21 delivers a perfect fit and seamless assembly with TEL VIGUS RK4 equipment.


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