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ICP Plasma Etching Plate

ICP Plasma Etching Plate

Semicorex's ICP Plasma Etching Plate provides superior heat and corrosion resistance for wafer handling and thin film deposition processes. Our product is engineered to withstand high temperatures and harsh chemical cleaning, ensuring durability and longevity. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.

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Silicon Etch Plate for PSS Etching Applications

Silicon Etch Plate for PSS Etching Applications

Semicorex's Silicon Etch Plate for PSS Etching Applications is a high-quality, ultra-pure graphite carrier that is specifically designed for epitaxial growth and wafer handling processes. Our carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The silicon etch plate for PSS etching applications has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.

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Do you want buy advanced and durable GaN-Plasma-Etching? Semicorex is definitely your good choice. We are known as one of the most competitive GaN-Plasma-Etching manufacturers and suppliers in China. We also provide bulk packing. You may need some customized services to meet the actual needs of your region, you can leave us a message through the contact information on the webpage. We sincerely welcome new and old customers to visit our factory for consultation and negotiation.
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