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High-Temperature SiC Coating for Plasma Etch Chambers

High-Temperature SiC Coating for Plasma Etch Chambers

When it comes to wafer handling processes such as epitaxy and MOCVD, Semicorex's High-Temperature SiC Coating for Plasma Etch Chambers is the top choice. Our carriers provide superior heat resistance, even thermal uniformity, and durable chemical resistance thanks to our fine SiC crystal coating.

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Silicon Epitaxial Deposition In Barrel Reactor

Silicon Epitaxial Deposition In Barrel Reactor

If you need a high-performance graphite susceptor for use in semiconductor manufacturing applications, the Semicorex Silicon Epitaxial Deposition In Barrel Reactor is the ideal choice. Its high-purity SiC coating and exceptional thermal conductivity provide superior protection and heat distribution properties, making it the go-to choice for reliable and consistent performance in even the most challenging environments.

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Barrel Structure for Semiconductor Epitaxial Reactor

Barrel Structure for Semiconductor Epitaxial Reactor

With its exceptional thermal conductivity and heat distribution properties, the Semicorex Barrel Structure for Semiconductor Epitaxial Reactor is the perfect choice for use in LPE processes and other semiconductor manufacturing applications. Its high-purity SiC coating provides superior protection in high-temperature and corrosive environments.

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Do you want buy advanced and durable Carbide-Graphite? Semicorex is definitely your good choice. We are known as one of the most competitive Carbide-Graphite manufacturers and suppliers in China. We also provide bulk packing. You may need some customized services to meet the actual needs of your region, you can leave us a message through the contact information on the webpage. We sincerely welcome new and old customers to visit our factory for consultation and negotiation.
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